Methods and devices for forming nanostructure monolayers and devices including such monolayers
AssigneeSanDisk Corporation
InventorsJian Chen, Karen Chu Cruden, Xiangfeng Duan, Chao Liu, J. Wallace Parce
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Abstract
Methods are provided for forming a nanostructure array. An example method includes providing a first layer, providing nanostructures dispersed in a solution comprising a liquid form of a spin-on-dielectric, wherein the nanostructures comprise a silsesquioxane ligand coating, disposing the solution on the first layer, whereby the nanostructures form a monolayer array on the first layer, and curing the liquid form of the spin-on-dielectric to provide a solid form of the spin-on-dielectric. Numerous other aspects are provided.
Claims20
A method for forming a nanostructure array, the method comprising:
- providing a first layer;
- providing nanostructures dispersed in a solution comprising a liquid form of a spin-on-dielectric, wherein the nanostructures comprise a silsesquioxane ligand coating;
- disposing the solution on the first layer, whereby the nanostructures form a monolayer array on the first layer;
- and
- curing the liquid form of the spin-on-dielectric to provide a solid form of the spin-on-dielectric.
A method for forming a nanostructure array, the method comprising:
- providing a first layer;
- providing nanostructures dispersed in a solution comprising a liquid form of a spin-on-dielectric, wherein each of the nanostructures comprises a silsesquioxane ligand associated with a surface of the nanostructure;
- disposing the solution on the first layer, whereby the nanostructures form a monolayer array on the first layer;
- and
- curing the liquid form of the spin-on-dielectric to provide a solid form of the spin-on-dielectric.
Dependencies are inferred from the claim text.