Plasma spray method for the manufacture of an ion conductive membrane
OwnerMalko Gindrat, Rajiv J. Damaniinventors
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Abstract
A plasma spray method for the manufacture of an ion conductive membrane is provided which ion conductive membrane has an ion conductivity, in which method the membrane is deposited as a layer (11) onto a substrate (10) in a process chamber, wherein a starting material (P) is sprayed onto a surface of the substrate (10) in the form of a process beam (2) by means of a process gas (G), wherein the starting material is injected into a plasma at a low process pressure, which is at most 10,000 Pa, and is partially or completely molten there. Oxygen (O2; 22) is supplied to the process chamber (12) during the spraying at a flow rate which amounts to at least 1%, preferably at least 2%, of the overall flow rate of the process gas.
Claims20
A method of manufacturing an ion conductive membrane having an ion conductivity, the method comprising:
- arranging a substrate in a process chamber;
- plasma spraying a starting material via a process beam that includes a process gas, wherein during the plasma spraying the starting material is injected into a plasma at a process pressure which is at most 10,000 Pa, and is partially or completely molten there;
- forming a layer on a surface of the substrate in the process chamber by depositing the plasma sprayed starting material;
- and
- supplying oxygen to the process chamber during the plasma spraying,
- wherein the oxygen is supplied at a flow rate which amounts to at least 1% of an overall flow rate of the process gas and from a location outside the process beam.
A method of manufacturing an ion conductive membrane having an ion conductivity, the method comprising:
- arranging a substrate in a process chamber;
- plasma spraying a powder starting material via a process beam that includes a process gas, wherein during the plasma spraying the starting material is injected into a plasma at a process pressure which is at most 10,000 Pa, and is partially or completely molten there;
- forming a layer on a surface of the substrate in the process chamber by depositing the plasma sprayed starting material;
- and
- supplying oxygen to the process chamber from a location outside the process beam, at a flow rate which amounts to at least 1% of an overall flow rate of the process gas, and so that the oxygen mixes with the process beam and is present in a vicinity of the substrate,
- wherein a chemical composition of the starting material is substantially the same as a chemical composition of the layer.
A method of manufacturing an ion conductive oxygen permeable membrane, the method comprising:
- arranging a substrate in a process chamber;
- plasma spraying a starting material via a process beam that includes a process gas, wherein during the plasma spraying the starting material is injected into a plasma at a process pressure which is at most 10,000 Pa, and is partially or completely molten there;
- forming a layer on a surface of the substrate in the process chamber by depositing the plasma sprayed starting material;
- and
- supplying oxygen to the process chamber during the plasma spraying at a flow rate which amounts to at least 1% of an overall flow rate of the process gas and from a location outside the process beam, whereby the oxygen mixes with the process beam and is present in a vicinity of the substrate,
- wherein a chemical composition and a perovskite phase structure of the starting material is substantially the same as a chemical composition and a perovskite phase structure of the layer.
Dependencies are inferred from the claim text.