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US 8,865,268 B2Granted
Method and apparatus
AssigneeNokia Corporation
InventorsSamiul Haque, Reijo K. Lehtiniemi, Asta M. Karkkainen, Lorenz Lechner, Pertti Hakonen
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Abstract
A method and apparatus, the method including: forming a recess in a graphene layer wherein the recess creates a boundary between a first portion of the graphene layer and a second portion of the graphene layer; depositing electrically insulating material within the recess; and depositing an electrically conductive material over the insulating material.
Claims10
A method comprising:
- forming a recess using a focussed ion beam in a graphene layer wherein the recess creates a boundary between a first portion of the graphene layer and a second portion of the graphene layer, wherein the first portion comprises a nanoribbon, wherein the second portion comprises a nanoribbon, and wherein a width of each nanoribbon is between about 10 nm and about 150 nm;
- depositing electrically insulating material within the recess using a focussed ion beam;
- and
- depositing an electrically conductive material over the insulating material using a focussed ion beam.
1 more element
Dependencies are inferred from the claim text.