Film capacitor element, film capacitor, and method of producing the film capacitor element

A film capacitor element comprising a base dielectric film layer, a vapor-deposition metal film layer formed on at least one of opposite major surfaces of the base dielectric film layer, and a dielectric covering film layer formed integrally on the vapor-deposition metal film layer, by vapor-deposition polymerization or coating, characterized in that:

• a margin portion in which the vapor-deposition metal film layer is not formed is provided in a part of an end portion of the major surface of the base dielectric film layer, which part is spaced inwardly from an end face of the base dielectric film layer, the margin portion extending along the end face and dividing the vapor-deposition metal film layer into a first film portion and a second film portion such that the first and second film portions are positioned on respective opposite sides of the margin portion, the first film portion extending along the end face of the base dielectric film layer, while the second film portion being spaced apart from the first film portion by the margin portion;
• the dielectric covering film layer is integrally formed on the second film portion and in the margin portion, by vapor-deposition polymerization or coating, and includes a covering portion which fills the margin portion and covers an entire area of an end face of the second film portion on the side of the margin portion;
• and
• the first film portion includes a first non-covered portion which is not covered by the dielectric covering film layer.