Compositions used in formation of oxide material layers, methods of forming an oxide material layer using the same, and methods of fabricating a thin film transistor using same
AssigneeIndustry-Academic Cooperation Foundation, Yonsei University
InventorsHyun Jae Kim, Dong Lim Kim, Joohye Jung, You Seung Rim
Life of this patent
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Abstract
Methods of forming an oxide material layer are provided. The method includes mixing a precursor material with a peroxide material to form a precursor solution, coating the precursor solution on a substrate, and baking the coated precursor solution.
Claims15
A method of forming an oxide material layer, comprising:
- (a) mixing a precursor material with a peroxide material to form a precursor solution;
- (b) coating the precursor solution on a substrate;
- and
- (c) baking the coated precursor solution.
A method of forming an oxide material layer, comprising:
- (a) mixing a precursor material with a peroxide material to form a precursor solution;
- (b) coating the precursor solution on a substrate;
- and
- (c) baking the coated precursor solution, wherein the baking step includes:
- (d) soft baking the substrate to remove solvent in the coated precursor solution after the step (b);
- and
- (e) hard baking the substrate to form an oxide material layer.
A method of forming an oxide material layer, comprising:
- (a) forming a precursor solution;
- (b) coating the precursor solution on a substrate;
- (d) soft baking the substrate to remove solvent in the coated precursor solution;
- (e) hard baking the substrate after the step (d) to form an oxide material layer;
- and
- (f) supplying photo energy to the substrate after at least one step among the steps (a), (b), (d) and (e).
A method of forming an oxide material layer, comprising:
- coating a precursor solution on a substrate, the precursor solution being formed by mixing a precursor material with a peroxide material;
- and
- supplying photo energy to the substrate on which the precursor solution is coated.
A composition used in formation of an oxide material layer, comprising:
- a precursor material;
- and
- a peroxide material.
Dependencies are inferred from the claim text.