Corrosion-resistant bonding agents for bonding ceramic components which are exposed to plasmas
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Ren-Guan Duan, Kenneth S. Collins
Life of this patent
Estimating the term…
Abstract
Embodiments of the invention relate to component structures which are useful as apparatus in plasma processing chambers. Portions of the component structures are bonded together using oxyfluoride-comprising glazes, glass ceramics, and combinations thereof. The bonding material is resistant to halogen-containing plasmas and exhibits desirable mechanical properties.
Claims6
A method of bonding together portions of a ceramic component where the component composition is resistant to fluorine-comprising corrosive etchant plasmas used in a semiconductor industry or MEMS industry to produce patterned structures, said method comprising:
- contacting an area of said portions of a ceramic component to be bonded together with a bonding agent which comprises a metal fluoride selected from the group consisting of YF3, NdF3, AlF3, ZrF4, SmF3, CeF3, DyF3, GdF3, InF3, LaF3, ThF4, TmF3,YbF3, BaF2, CaF2, and combinations thereof, where said bonding agent , when co-fired with said portions of said ceramic component, reacts to form an oxyfluoride glass-ceramic comprising transition area between said portions of said ceramic component and said bonding agent, which transition area includes from at least 0.1 volume % amorphous phase up to about 50 volume % amorphous phase and ,wherein said oxyfluoride glass-ceramic comprising transition area exhibits, upon exposure to a CF4 —CHF3 etchant plasma, an erosion rate which is lower than an erosion rate of said portions of ceramic component.
Dependencies are inferred from the claim text.