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US 8,853,078 B2Granted
Method of depositing material
AssigneeFEI Company
InventorsAurelien Philippe Jean Maclou Botman, Steven Randolph, Milos Toth
Life of this patent
Estimating the term…
Abstract
Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
Claims26
A method of depositing material onto a work piece in a vacuum chamber of a particle beam system, comprising:
- providing within the vacuum chamber of a particle beam system multiple gases including a metal-fluorophosphine compound and a halogen compound;
- providing a work piece having a surface that does not provide reacting conditions wherein reacting conditions would allow the gases to spontaneously react with each other and deposit material on the surface;
- and
- directing a photon beam, focused ion beam, or an electron beam toward a portion of the work piece to provide at the portion of the work piece surface the reacting conditions for the multiple gases to react spontaneously, which initiates deposition of the material onto the portion of the work piece surface and wherein the spontaneous reaction continues even after the beam ceases.
1 more element
A method of depositing material onto a work piece, comprising:
- directing a photon beam, a focused ion beam, or an electron beam toward a work piece to prepare a work piece surface so that the work piece surface includes portions that support initiation of a deposition reaction and portions that do not support the initiation of the deposition reaction;
- providing at the work piece surface multiple gases including a metal-fluorophosphine compound and a halogen compound that react with each other to deposit a material at the portions of the surface that support the initiation of the deposition reaction to selectively deposit material in a pattern onto the work piece surface;
- and wherein directing a photon beam toward a work piece includes portions that do not support the initiation of the spontaneous deposition reaction wherein it provides a surface for multiple gases.
Dependencies are inferred from the claim text.