Parallel substrate treatment for a plurality of substrate treatment lines

A substrate treating apparatus comprising:

• a plurality of substrate treatment lines configured to treat substrates, each line including a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units corresponding to each of the main transport mechanisms;
• wherein each of the substrate treatment lines is carrying out a series of treatments on the substrates, each of the main transport mechanisms transporting the substrates to the treating units associated therewith, and transferring the substrates to another main transport mechanism positioned horizontally adjacent thereto;
• and
• wherein the plurality of substrate treatment lines are arranged vertically;
• wherein an atmosphere of transporting spaces where the main transport mechanisms are installed is blocked off for each of the substrate treatment lines;
• wherein each of the substrate treatment lines includes:
• blowout units, each blowout unit being in form of a flat box having an area substantially equal to that of each of the transporting spaces, and having gas supply openings in form of numerous small bores formed in one surface thereof and directed downward for supplying a gas into the transporting spaces;
• and
• exhaust units, each exhaust unit being in form of a flat box having an area substantially equal to that of each of the transporting spaces, and having gas exhaust openings in form of numerous small bores formed in one surface thereof and directed upward for exhausting the gas from the transporting spaces;
• the gas supply openings being arranged in a position higher than the gas exhaust openings;
• and
• the atmosphere of the transporting spaces being blocked off for each of the substrate treatment lines by at least one of the blowout units and the exhaust units;
• and
• at least one of the exhaust units is in direct contact with at least one of the blowout units in an area between the transporting spaces;
• and
• wherein the series of treatments carried out in each of the substrate treatment lines is the same.