Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsDaisuke Domon, Keiichi Masunaga, Satoshi Watanabe
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Abstract
There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.
Claims28
A sulfonium salt shown by the following general formula (1),
- wherein
- R1 represents any of a hydrogen atom, a fluorine atom, a methyl group, and a trifluoromethyl group,
- each R2, R3, and R4 independently represents any of a substituted or unsubstituted linear, branched, or cyclic alkyl group, alkenyl group, and oxoalkyl group having 1 to 10 carbon atoms;
- any of a substituted or unsubstituted aryl, aralkyl, and aryl oxoalkyl group having 6 to 18 carbon atoms;
- or any two or more of R2, R3, and R4 may be bonded with each other to form a ring together with a sulfur atom in the formula,
- X1 represents O or CH2,
- A1 represents a linear, a branched, or a cyclic divalent hydrocarbon group having 1 to 10 carbon atoms,
- B1 represents an alkylene group having 1 to 10 carbon atoms or an arylene group having 6 to 18 carbon atoms wherein these groups may contain an ether oxygen atom, and
- k1 represents an integer of 0 or 1.
A polymer having a repeating unit shown by the following general formula (2) and a repeating unit shown by the following general formula (3),
- wherein
- R1 represents any of a hydrogen atom, a fluorine atom, a methyl group, and a trifluoromethyl group,
- each R2, R3, and R4 independently represents any of a substituted or unsubstituted linear, branched, or cyclic alkyl group, alkenyl group, and oxoalkyl group having 1 to 10 carbon atoms;
- any of a substituted or unsubstituted aryl, aralkyl, and aryl oxoalkyl group having 6 to 18 carbon atoms;
- or any two or more of R2, R3, and R1 may be bonded with each other to form a ring together with a sulfur atom in the formula,
- X1 represents O or CH2,
- A1 represents a linear, a branched, or a cyclic divalent hydrocarbon group having 1 to 10 carbon atoms,
- B1 represents an alkylene group having 1 to 10 carbon atoms or an arylene group having 6 to 18 carbon atoms wherein these groups may contain an ether oxygen atom, and
- k1 represents an integer of 0 or 1;
- and
- wherein
- “q” represents 0 or 1,
- “r” represents an integer of 0 to 2,
- R5 represents any of a hydrogen atom, a fluorine atom, a methyl group, and a trifluoromethyl group,
- each R6 independently represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms,
- B2 represents a single bond or an alkylene group having 1 to 10 carbon atoms and optionally containing an ether bond,
- “a” represents an integer satisfying a≦5+2r−b, and
- “b” represents an integer of 1 to 3.
Dependencies are inferred from the claim text.