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US 8,833,564 B1Granted
Systems and methods for reducing dust in granular material
AssigneeSunEdison Semiconductor Limited
InventorsSeok-Min Yun, Seong-Su Park, Se-Myung Kim, Won-Jin Choi, Woo-Jin Yoon
Life of this patent
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Abstract
A method of removing dust from granular polysilicon includes introducing a stream of granular polysilicon, dispersing the longitudinal stream of granular polysilicon by redirecting the stream into a radially outward flow having a circular pattern, and introducing a counter flow of gas in an opposite direction to that of the longitudinal stream of granular polysilicon to contact the radially outward flow to separate the dust from the granular polysilicon.
Claims9
A method of removing dust from granular polysilicon, the method comprising:
- introducing a stream of granular polysilicon into a canister from an inlet positioned opposite a disperser;
- dispersing the stream of granular polysilicon by redirecting the stream into a radially outward flow by the disperser;
- introducing a counter flow of gas in an opposite direction to that of the stream of granular polysilicon to contact the radially outward flow to separate the dust from the granular polysilicon;
- wherein the inlet is connected with a domed hood located within the canister to prevent reversed flow of the stream of granular polysilicon from the inlet into a dust outlet;
- introducing a cross-flow of gas to increase turbulence of the radially outward flow radially outward from a center axis of the canister from below the domed hood and the inlet.
2 more elements
Dependencies are inferred from the claim text.