Method of forming a micro-electromechanical system device

A structure of a micro-electromechanical system (MEMS) device made in accord with a method, comprising:

• (A) forming a removable layer atop a substrate, the substrate having an anchor extending therefrom, wherein the anchor is configured to support a structure;
• (B) depositing a metallic alloy layer atop the removable layer, wherein the metallic alloy layer comprises about 50 to about 99 percent of a constituent metallic material;
• (C) removing the removable layer to form the structure comprising the metallic alloy layer, wherein the structure is configured to be deformable between a first position in which the structure is separated from a contact disposed atop the substrate by a separation distance and a second position in which the structure contacts the contact and stores mechanical energy;
• (D) annealing the metallic alloy layer at a first temperature to provide the structure having a steady-state plastic strain rate of less than or equal to about 10−12 s−1 when subject to a stress of up to about 25 percent of the yield strength of the metallic alloy layer at temperatures less than or equal to about half of a melting temperature of the metallic alloy layer, wherein the first temperature is about 40 degrees Celsius to about 50% of a melting temperature of one or more materials from which the metallic alloy layer is formed;
• and
• E) subsequent to annealing the structure, heating a hermetic sealing cap to a second temperature to bond the hermetic sealing cap over the metallic alloy layer, wherein the second temperature is less than the first temperature and wherein D) is performed between B) and C) or between C) and E).