Self-assembled structures, method of manufacture thereof and articles comprising the same

A method of manufacturing a photoresist comprising:

• mixing a composition comprising:
• a graft block copolymer comprising:
• a first block polymer;
• the first block polymer comprising a backbone polymer and a first graft polymer;
• where the first graft polymer comprises a surface energy reducing moiety;
• and
• a second block polymer;
• the second block polymer being covalently bonded to the first block polymer;
• wherein the second block polymer comprises the backbone polymer and a second graft polymer;
• where the second graft polymer comprises a functional group that is operative to crosslink the graft block copolymer;
• a photoacid generator;
• and
• a crosslinking agent;
• disposing the composition on a substrate;
• forming a film on the substrate;
• disposing a mask on the film;
• exposing the film to electromagnetic radiation to form a crosslinked film that comprises bottle-brushes;
• baking the film;
• and
• dissolving unreacted portions of the film.