Semiconductor device having a porous nickel plating part
AssigneePanasonic Corporation
InventorsKeiko Ikuta, Lianji Jin, Takayuki Hirose, Toshiyuki Kojima, Norihito Tsukahara, Kohichi Tanda
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AssigneePanasonic Corporation
InventorsKeiko Ikuta, Lianji Jin, Takayuki Hirose, Toshiyuki Kojima, Norihito Tsukahara, Kohichi Tanda
Estimating the term…
A semiconductor device which can reduce a heat stress to a solder layer while suppressing an increase of thermal resistance is provided. A semiconductor device includes a semiconductor element, a solder layer which is arranged on at least one surface of the semiconductor element and a lead frame which is arranged on the solder layer so that a porous nickel plating part is sandwiched between the lead frame and the solder layer. Compared with a case that the semiconductor element and the lead frame are jointed by a solder directly, an increased part of a thermal resistance of the solder junction is held down only to a part of the porous nickel plating part and a thermal resistance applied to the solder layer can be reduced.
A semiconductor device comprising:
Dependencies are inferred from the claim text.