Rule coverage rate auto-extraction and rule number auto-mark
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-Ming Chao, Jyh-Kang Ting, Chin-An Chen, Pei-tzu Wu, Chun-Yi Lee
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChih-Ming Chao, Jyh-Kang Ting, Chin-An Chen, Pei-tzu Wu, Chun-Yi Lee
Estimating the term…
A target integrated circuit layout having a plurality of design rules having minimum rules and standard rules used in the target integrated circuit layout is provided. First and second design rule checks are performed, where respective first and second sets of violations of the plurality of design rules and each design rule associated with the first and second sets of violations are recorded. An analysis is performed on the first and second sets of violations, each design rule associated with the first and second sets of violations, and a frequency of usage of each of the plurality of design rules, and a rule usage rate is determined having a number of minimum rules used overall and a number of overall violations of the design rules. An interactive rule database is formed having statistics associated with the rule usage rate for subsequent implementation in an integrated circuit.
A method for analyzing an integrated circuit layout, the method comprising:
A method for generating a photolithography mask, the method comprising:
A computer program product for analyzing a design rule coverage rate, the computer program product having a non-transitory computer readable medium with a computer program embodied thereon, the computer program comprising a computer program code for:
Dependencies are inferred from the claim text.