Modeling multi-patterning variability with statistical timing

A method comprising:

• defining at least one source of variation in an integrated circuit design:
• and
• modeling the at least one source of variation for at least two patterns in at least one level of the integrated circuit design as at least two sources of variability respectively,
• wherein the at least two sources of variability each comprise a mean distribution for the at least one source of variation, a sensitivity to global distribution for the at least one source of variation, a sensitivity to spatial distribution for the at least one source of variation, and a sensitivity to random distribution for the at least one source of variation, and
• wherein the modeling is performed by at least one computing device.

A computer system for modeling multi-patterning variability, the system comprising:

• a CPU, a computer readable memory, and a computer readable storage media;
• first program instructions for querying fabrication measurements associated with at least one source of variation for at least one level of the integrated circuit design:
• second program instructions for defining the at least one source of variation in the integrated circuit design;
• third program instructions for modeling the at least one source of variation for at least two patterns in at least one level of the integrated circuit design as at least two sources of variability respectively;
• and
• fourth program instructions for defining shift and scale factors that modify the at least one source of variation for the at least one level of the integrated circuit design based on the fabrication measurements,
• wherein the first, second, third, and fourth program instructions are stored on the computer readable storage media for execution by the CPU via the computer readable memory, and
• the modeling comprises using the shift and scale factors to model the at least two sources of variability.