Method and device for increasing fin device density for unaligned fins

A photomask comprising:

• a first mandrel associated with a first active region;
• a second mandrel associated with a second active region, the second mandrel is parallel to the first mandrel, wherein a first distance between the first active region and the second active region in a first direction is equal to or less than a minimum spacing;
• and
• at least one connective element between the first mandrel and the second mandrel.

A layout generator, comprising:

• a processor;
• and
• a memory storage component configured to store instructions for executing the following steps:
• receiving a first layout, the first layout including a plurality of active regions, each active region of the plurality of active regions having sides;
• for each of the plurality of active regions, defining a plurality of elongate mandrels that each extend in a first direction and are spaced apart from one another in a second direction perpendicular to the first direction;
• for each adjacent pair of partially-parallel active regions of the plurality of active regions having a minimum distance less than a specified minimum spacing, connecting at least a portion of nearest ends of pairs of elongate mandrels, each mandrel of a pair from a different active region of the adjacent pair of partially-parallel active regions;
• and
• generating a second layout using a layout-generating machine, said second layout including the plurality of active regions, a plurality of elongate mandrels in the plurality of active regions, and connective elements between active regions of at least one adjacent pair of partially-parallel active regions.