Distinguishable IC patterns with encoded information
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Ming Chang, Tzu-Chin Lin, Jen-Chieh Lo, Yu-Po Tang, Tsong-Hua Ou
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Ming Chang, Tzu-Chin Lin, Jen-Chieh Lo, Yu-Po Tang, Tsong-Hua Ou
Estimating the term…
A method of designing an IC design layout having similar patterns filled with a plurality of indistinguishable dummy features, in a way to distinguish all the patterns, and an IC design layout so designed. To distinguish each pattern in the layout, deviations in size and/or position from some predetermined equilibrium values are encoded into a set of selected dummy features in each pattern at the time of creating dummy features during the design stage. By identifying such encoded dummy features and measuring the deviations from image information provided by, for example, a SEM picture of a wafer or photomask, the corresponding pattern can be located in the IC layout. For quicker and easier identification of the encoded dummy features from a given pattern, a set of predetermined anchor dummy features may be used.
A method of making an integrated circuit (“IC”) design layout in a way to distinguish a plurality of similar patterns contained therein, each of the patterns comprising a plurality of dummy features, the method comprising:
An integrated circuit (IC) layout comprising a plurality of resembling patterns, each of the patterns comprising,
A method comprising:
Dependencies are inferred from the claim text.