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US 8,804,307 B2Granted
Highly dielectric film having high withstanding voltage
AssigneeDaikin Industries, Ltd.
InventorsMeiten Koh, Kouji Yokotani, Miharu Matsumura, Eri Mukai, Nobuyuki Komatsu
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Abstract
The present invention relates to a highly dielectric film formed by using (A) a fluorine-containing resin comprising vinylidene fluoride unit and tetrafluoroethylene unit in a total amount of not less than 95% by mole, and provides a film for a film capacitor which has high dielectric property and high withstanding voltage and can be made thin.
Claims3
A film capacitor prepared by laminating an electrode layer on at least one surface of the highly dielectric film,
- said highly dielectric film is prepared by a coating method and is formed by using (A) a fluorine-containing resin of a copolymer comprising 60 to 82% by mole of vinylidene fluoride unit and 18 to 40% by mole of tetrafluoroethylene unit.
Dependencies are inferred from the claim text.