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US 8,802,977 B2Granted
Techniques for enhancing performance of photovoltaic devices
AssigneeInternational Business Machines Corporation
InventorsMin Yuan, David B. Mitzi, Wei Liu
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Abstract
Techniques for improving energy conversion efficiency in photovoltaic devices are provided. In one aspect, an antimony (Sb)-doped film represented by the formula, Cu1-yIn1-xGaxSbzSe2-wSw, provided, wherein: 0≦x≦1, and ranges therebetween; 0≦y≦0.2, and ranges therebetween; 0.001≦z≦0.02, and ranges therebetween; and 0≦w≦2, and ranges therebetween. A photovoltaic device incorporating the Sb-doped CIGS film and a method for fabrication thereof are also provided.
Claims4
A method of fabricating a photovoltaic device, comprising the steps of:
- providing a substrate;
- and
- forming an Sb-doped absorber layer formed on the substrate represented by a formula,
- Cu1-yIn1-xGaxSbzSe2-wSw,
- wherein:
- 0≦x≦1, and ranges therebetween;
- 0≦y≦0.2, and ranges therebetween;
- 0.001≦z≦0.02, and ranges therebetween;
- 0≦w≦2, and ranges therebetween,
- wherein an amount of Sb in the absorber layer is from about 0.1 atomic percent to about 2 atomic percent of that of a sum of the In and the Ga,
- and wherein the absorber layer has a grain size of from about 0.2 μm to about two μm measured as a longest length of a grain from a cross-section of the absorber layer, and wherein the longest length of the grain from the cross-section of the film is greater than or equal to a thickness of the film;
- and
- performing a final anneal of the absorber layer at a temperature of from about 350° C. to about 375° C.,
- wherein the step of forming the Sb-doped absorber layer further comprises the steps of:
- preparing an Sb-doped absorber layer precursor solution;
- spin-coating the Sb-doped absorber layer precursor solution onto the substrate;
- annealing the Sb-doped absorber precursor layer coated on the substrate, wherein the annealing step comprises an intermediate anneal that is configured to decompose the Sb-doped absorber precursor layer coated on the substrate;
- and
- repeating the spin-coating and annealing steps until a desired thickness for the Sb-doped absorber layer is achieved, wherein the spin-coating and annealing steps are all performed in-situ in a same inert atmosphere, in a same nitrogen-filled drybox,
- and wherein the step of preparing the Sb-doped absorber layer precursor solution, further comprises the step of:
- dissolving a Cu source, an In source, a Ga source, an Se source and an Sb source in hydrazine to produce one or more component solutions, wherein the Sb source is antimony trisulfide;
- and
- mixing two or more of the component solutions to form the Sb-doped absorber layer precursor solution.
20 more elements
Dependencies are inferred from the claim text.