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US 8,802,783 B2Granted
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
AssigneeNEC Corporation
InventorsKatsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
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Abstract
A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.
Claims2
A photoresist material comprising:
- a polymer having the following structure;
- wherein x=0.7, y=0.3;
- and
- a photo-acid generator for generating an acid by exposure.
1 more element
Dependencies are inferred from the claim text.