Stabilized hydrogen peroxide solutions
AssigneeAkzo Nobel N.V.
InventorsDavid J. Bonislawski, David C. Lovetro
Life of this patent
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Abstract
The present invention is directed to a stabilized hydrogen peroxide solution containing stabilizers that maintain relatively high hydrogen peroxide stability in both concentrated form and when formulated into a cleaning solution that has a pH above 6 and contains components that normally would have a destabilizing effect on the hydrogen peroxide. The stabilizers include a first cyclic amino methane diphosphonic acid compound stabilizer in combination with a second phosphonic acid based stabilizer (different from the cyclic amino methane diphosphonic acid compound), wherein the weight ratio of the first stabilizer to the second stabilizer is at least about 2:1.
Claims9
A cleaning solution comprising:
- (a) from about 0.5 to about 8 wt %, based on the entire solution, of hydrogen peroxide;
- (b) from about 0.3 to about 1.5 wt %, based on the amount of hydrogen peroxide, of a first cyclic amino methane diphosphonic acid compound stabilizer;
- (c) a second phosphonic acid based stabilizer, different from said first cyclic amino methane diphosphonic acid compound, selected from the group consisting of an amino phosphonic acid having three or more phosphonic acid groups in its structure, their salts, and combinations thereof;
- and
- (d) a surfactant;
- wherein the pH of said cleaning solution is at least 7 to about 10.5 and the weight ratio of (b) to (c) is in the range from about 10:1 to about 500:1.
Dependencies are inferred from the claim text.