Interconnect structure with an electromigration and stress migration enhancement liner

A method of forming an interconnect structure comprising:

• forming a first interconnect dielectric material having at least one conductive feature located therein;
• forming a dielectric capping layer atop the first interconnect dielectric material;
• forming a second interconnect dielectric material having at least one via opening that extends through said second interconnect dielectric material and the dielectric capping layer;
• forming an electromigration and stress migration enhancement liner within the at least one via opening, said electromigration and stress migration enhancement liner comprising a metal that has a thickness at a bottom of said at least one via opening and on an exposed portion of the at least one conductive feature that is at least 3 times greater than a remaining thickness that is located on exposed sidewalls of said second interconnect dielectric material;
• forming a diffusion barrier on the electromigration and stress migration enhancement liner and within said at least one via opening;
• forming an adhesion liner on the diffusion barrier and within said at least one via opening;
• and
• forming a conductive region on the adhesion liner and within said at least one via opening.