Laser processing method
AssigneeHamamatsu Photonics K.K.
InventorsFumitsugu Fukuyo, Kenshi Fukumitsu
Life of this patent
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Abstract
A laser processing method which can highly accurately cut objects to be processed having various laminate structures is provided. An object to be processed comprising a substrate and a laminate part disposed on the front face of the substrate is irradiated with laser light L while a light-converging point P is positioned at least within the substrate, so as to form a modified region due to multiphoton absorption at least within the substrate, and cause the modified region to form a starting point region for cutting. When the object is cut along the starting point region for cutting, the object 1 can be cut with a high accuracy.
Claims12
A laser processing method comprising the steps of:
- irradiating an object to be processed comprising a substrate and a laminate part disposed on a front face of the substrate with laser light while positioning a light-converging point at least within the substrate, thereby forming a modified region embedded within the substrate along each line of a plurality of cutting lines arranged in a grid with respect to the substrate, each substrate modified region forming a starting point region for cutting the object inside the object at a predetermined distance from a laser light incident face of the object;
- and
- after completion of forming the substrate modified regions, applying an artificial force to the object which causes cutting of the substrate and the laminate part along the cutting lines thereby generating a fracture in a thickness direction of the substrate from each starting point region that reaches a front face of the laminate part and a rear face of the substrate,
- wherein after the irradiation of the laser light is performed, each substrate modified region exists only within the substrate,
- wherein at least one of the front and back face of the substrate is a surface of the substrate into which the laser light enters, and
- wherein a portion of the laminated part disposed on each cutting line includes a plurality of layers with at least one of the layers being made of different material than another of the layers.
A method of manufacturing a semiconductor device formed using a laser processing method, the manufacturing method comprising;
- irradiating an object to be processed comprising a substrate and a laminate part disposed on a front face of the substrate, the substrate and the laminate part having at least one semiconductor device, with laser light while positioning a light-converging point at least within the substrate, thereby forming a modified region embedded within the substrate along each line of a plurality of cutting lines arranged in a grid with respect to the substrate, each substrate modified region forming a starting point region for cutting the object, each substrate modified region being located inside the object at a predetermined distance from a laser light incident face of the object;
- and
- after completion of forming the substrate modified regions, applying an artificial force to the object causing cutting of the substrate and the laminate part along the cutting lines thereby generating a fracture in a thickness direction of the substrate from each starting point region that reaches a front face of the laminate part and a rear face of the substrate, wherein completion of the cutting step results in provision of at least one manufactured semiconductor device,
- wherein after the irradiation of the laser light is performed, each substrate modified region exists only within the substrate,
- wherein at least one of the front and back face of the substrate is a surface of the substrate into which the laser light enters, and
- wherein a portion of the laminated part disposed on each cutting line includes a plurality of layers with at least one of the layers being made of different material than another of the layers.
Dependencies are inferred from the claim text.