Salt, photoresist composition and method for producing photoresist pattern

A salt represented by formula (I):

• wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group,
• the moiety L1-OH of formula (I) is represented by formula (L1-1):
• wherein X0 represents a single bond,
• a C1-C14 divalent aliphatic hydrocarbon group which can have a fluorine atom or a hydroxyl group, or
• a group represented by formula (a-1):
• -A10X10-A11s X11-A12-* (a-1)
• where s represents an integer of 0 or 1, X10 and X11 each independently respect an oxygen atom, a carbonyl group, a carbonyloxy group, or an oxycarbonyl group, A10,A11 and A12 each independently represent a C1-C12 divalent aliphatic hydrocarbon group which can have a fluorine atom or a hydroxyl group, * represents a binding position to a corbon atom, X1 represents —O-*1, —NR2-*1, —O—CO-*1, —O—CH2—CO—O-*1 or —NR2—CH2-*1 where *1 represents a binding position to W,
• *0 represents a binding position to a carbon atom binding to Q1 and Q2, and
• m1 represents an integer of 0 to 6,
• W represents a C3-C36 alicyclic hydrocarbon group
• in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, and in which a hydrogen atom can be replaced by a hydroxy group, a C1-C12 alkyl group, a C1-C12 alkoxy group, C3-C18 alicyclic hydrocarbon group or C6-C14 aromatic hydrocarbon group, and
• Z+ represents an organic cation.