Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01),
• (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and
• (C) a resin that contains (c′) a repeating unit having at least either a fluorine atom or a silicon atom and having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer on one side chain:
• wherein
• T represents a single bond or a divalent linking group;
• Ran1 represents a hydrogen atom, a methyl group or a group represented by —CH2—R9, wherein R9 represents a hydroxyl group or a monovalent organic group;
• Lan represents a single bond or a divalent linking group;
• Xan represents (1+p)-valent alicyclic structure;
• p is an integer of 1 to 3;
• and
• Aan represents a single bond, an alkylene group, a cycloalkylene group, an oxy group, a carbonyl group, an amide group, or a group formed by combining two or more of these groups.