Methods for forming microlenses

A method of forming microlenses on a semiconductor substrate, the method comprising:

• performing an inductively coupled plasma etching process using a process gas in the interior of a processing chamber of an inductively coupled plasma processing apparatus on a substrate, the substrate comprising a lens material layer and a mask layer, the substrate comprising a plurality microlens objects having a lens shape formed on the mask layer, the inductively coupled plasma etching process transcribing the lens shape of the microlens objects formed on the mask layer to the lens material layer such that the plurality of microlens objects are formed on the lens material layer;
• wherein the process gas comprises a mixture of CF4 and CHF3;
• wherein the inductive coupled plasma processing apparatus comprises at least one inductive element and a grounded Faraday shield disposed between the at least one inductive element and the interior of the processing chamber.