Method and apparatus for stable plasma processing
AssigneeApplied Materials, Inc.
InventorsValentin N. Todorow, John P. Holland, Michael D. Willwerth
Life of this patent
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Abstract
A method and apparatus for etching a substrate using a spatially modified plasma is provided herein. In one embodiment, the method includes providing a process chamber having a plasma stabilizer disposed above a substrate support pedestal. A substrate is placed upon the pedestal. A process gas is introduced into the process chamber and a plasma is formed from the process gas. The substrate is etched with a plasma having an ion density to radical density ratio defined by the plasma stabilizer.
Claims18
An apparatus for plasma processing a substrate, comprising:
- a plasma processing chamber having an internal volume;
- a substrate support pedestal disposed in the internal volume;
- an inductive antenna for forming a plasma within the internal volume of the plasma processing chamber;
- a plasma stabilizer disposed in the internal volume of the plasma processing chamber above the pedestal, the plasma stabilizer having a diameter greater than a diameter of the pedestal and comprising:
- a member electrically isolated from the plasma processing chamber and having a plurality of apertures formed through the member;
- and
- a plurality of support legs supporting the member above the pedestal;
- and
- an edge ring disposed on the substrate support pedestal and having the plurality of support legs extending from the edge ring, wherein the plasma stabilizer is secured to the edge ring.
An apparatus for plasma etching, comprising:
- a process chamber having an internal volume;
- a substrate support pedestal disposed in the internal volume of the process chamber, wherein the substrate support pedestal comprises an edge ring;
- an inductive antenna for forming a plasma within the internal volume of the process chamber;
- a member secured to the edge ring and having a diameter greater than a diameter of the pedestal, wherein the member is electrically isolated from the process chamber;
- a plurality of apertures formed through the member;
- and
- a plurality of support legs extending from the edge ring and supporting the member above the pedestal.
Dependencies are inferred from the claim text.