Methods and systems for plasma deposition and treatment

A plasma deposition apparatus, comprising:

• a waveguide conduit having a plurality of openings at one side thereof and a plurality of slots at an opposite side thereof, each of said slots corresponding to one or more openings, said waveguide conduit being coupled to a microwave source through the waveguide conduit and enabling the microwaves to exit through the plurality of slots;
• a plurality of pipes, one or more of which extends into the waveguide conduit through each of the plurality of openings in the waveguide conduit, each of said pipes having an outlet end positioned at each at a slot corresponding to the opening through which said pipe extends for transporting material from one or more material sources to the plurality of slots, wherein a gap exists between the outlet end of each pipe and a slot at which it is positioned;
• a plasma chamber in communication with the waveguide tube through the plurality of slots, said plasma chamber receiving through said plurality of slots microwaves from the waveguide tube through said gaps and material to be melted or evaporated from the pipes, said plasma chamber including a plurality of magnets disposed in an outer wall of the plasma chamber for forming a magnetic field in the plasma chamber to enable formation of plurality of plasma regions therein, said plasma chamber further including a plurality of outlet openings for discharging a plurality of plasma beams, containing material to be deposited in corresponding discrete locations on a substrate disposed outside the plasma chamber;
• and
• a plunger moveably mounted in the waveguide conduit allowing the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the slots.