Adaptive patterning for panelized packaging

A non-transitory computer-readable storage medium having instructions stored thereon, which, when executed by a processor, cause the processor to perform adaptive patterning operations comprising:

• instructing an inspection tool to measure a position of each of a plurality of device units of a panel;
• defining a reference position of at least one feature on each of the plurality of device units, wherein the measured position has a different x-y position or orientation as compared to the reference position for the at least one of the plurality of device units;
• creating a unit-specific pattern comprising at least one of a first via pattern, a capture pad, and an interconnecting trace pattern, for each of the respective plurality of device units based upon the measured position for each of the respective device units by:
• calculating a delta-value between the measured position and the reference position for each of the respective plurality of device units;
• and
• adjusting a position of the unit-specific pattern by the same delta-value from the reference position of the unit-specific pattern for at least one of the plurality of device units;
• defining a position of the unit-specific pattern over each of the respective device units, wherein the unit-specific pattern created has a different x-y position or orientation as compared to the reference position for each of the respective device units;
• and
• instructing a patterning tool to form the unit-specific patterns over each of the plurality of device units, wherein each unit-specific pattern is aligned with the respective device unit.

An adaptive patterning system comprising:

• an inspection tool to measure a position of a plurality of device units on a panel, and create a file containing the measured position of each of the plurality of device units;
• wherein the inspection tool is configured to define a reference position of at least one feature on each of the plurality of device units, wherein the measured position has a different x-y position or orientation as compared to the reference position for the at least one of the plurality of device units;
• wherein the inspection tool is further configured to create a unit-specific pattern design comprising at least one of a first via pattern, a capture pad and an interconnecting trace pattern, for each of the plurality of device units based upon the measured position of each of the plurality of device units by
• calculating a delta-value between the measured position and the reference position for each of the respective plurality of device units;
• and
• adjusting a position of the unit-specific pattern by the same delta-value from the reference position of the unit-specific pattern for at least one of the plurality of device units;
• wherein the inspection tool is further configured to define a reference position of the unit-specific pattern over each of the respective device units, wherein the unit-specific pattern created has a different x-y position or orientation as compared to the reference position for each of the respective device units;
• and
• a patterning machine to import the unit-specific pattern design and form a patterned feature over each of the plurality of device units.