Self-aligned multiple patterning layout design

A system for performing design layout, comprising:

• a layout compliance component implemented at least in part via a processing unit and configured to:
• identify a mandrel pattern for forming a first set of one or more polygons via a first mask and a passive fill pattern for forming a second set of one or more polygons via a second pattern mask different than the first pattern mask within an initial design layout of an electrical component;
• generate an initial cut pattern for the initial design layout;
• responsive to identifying a design rule violation based upon one or more constraints associated with the initial cut pattern, modify the passive fill pattern by applying a passive pattern addition to a first polygon of the second set to generate a modified initial design layout;
• generate an updated cut pattern based upon the modified initial design layout;
• and
• apply the updated cut pattern to the modified initial design layout to generate a second design layout.

A non-transitory computer-readable medium comprising processor-executable instructions that when executed perform a method for design layout, comprising:

• receiving an initial design layout of an electrical component, the initial design layout comprising a mandrel pattern for forming a first set of one or more polygons via a first mask and a passive fill pattern for forming a second set of one or more polygons via a second pattern mask different than the first pattern mask;
• generating an initial trim pattern for the initial design layout;
• responsive to identifying a design rule violation associated with the initial trim pattern, modifying the passive fill pattern by applying a passive pattern addition to a first polygon of the second set to generate a modified initial design layout;
• generating an updated trim pattern based upon the modified initial design layout;
• applying the updated trim pattern to the modified initial design layout to generate a second design layout;
• and
• verifying the second design layout as self-aligned multiple patterning (SAMP) compliant.