Wavefront aberration measuring device and method and wavefront aberration adjusting method

A wavefront aberration measuring method for measuring a wavefront aberration of an optical system to be inspected without using an interference method, the wavefront aberration measuring method comprising steps of:

• applying a wavefront change to a light radiated from a point light source and outcome from the optical system;
• detecting a spot light formed on a predetermined surface optically conjugate with the point light source, with the light to which the wavefront change is applied;
• measuring a light intensity of the spot light formed on the predetermined surface;
• and
• measuring the wavefront aberration of the optical system, without using the interference method, based on the wavefront change applied so that the measured light intensity of the spot light is maximized,
• wherein in the step of applying of the wavefront change, the wavefront change is applied to the light radiated from the point light source and outcome from the optical system, based on a result of the measuring of the light intensity of the spot light formed on the predetermined surface, so that the light intensity to be measured is maximized, and
• the optical system is arranged with respect to the point light source such that the light outcome from the optical system is a parallel light and the wavefront change is applied to the parallel light.

A wavefront aberration adjusting method for adjusting the wavefront aberration of an optical system without using an interference method, the wavefront aberration adjusting method comprising steps of:

• applying a wavefront change to a light radiated from a point light source and outcome from the optical system;
• detecting a spot light formed on a predetermined surface optically conjugate with the point light source, with the light to which the wavefront change is applied;
• measuring a light intensity of the spot light formed on the predetermined surface;
• and
• measuring the wavefront aberration of the optical system, without using the interference method, based on the wavefront change applied so that the light intensity of the spot light is maximized,
• wherein the wavefront change is applied to the light outcome from the optical system by a variable mirror, and
• wherein in the step of applying of the wavefront change, the wavefront change is applied to the light radiated from the point light source and outcome from the optical system, based on a measuring result of the light intensity of the spot light formed on the predetermined surface, so that the light intensity to be measured is maximized, and
• the optical system is arranged with respect to the point light source such that the light outcome from the optical system is a parallel light and the wavefront change is applied to the parallel light.