Gradient refractive index lens array projection exposure

A method comprising:

• positioning an illumination device proximate to a first side of a mask on which a pattern is formed;
• positioning a gradient refractive index lens array between the mask and an exposed substrate, wherein the exposed substrate is proximate to a second side of the mask;
• moving the gradient refractive index array across an area of the exposed substrate in a first direction on a two dimensional plane that is parallel to the exposed substrate;
• and
• moving the gradient refractive index lens array across the area of the exposed substrate in a second direction on the two dimensional plane to increase uniformity of exposure of the exposed substrate to a projection of the pattern, wherein the second direction is perpendicular to the first direction.

A non-transitory computer-readable medium that includes instructions stored thereon, the instructions comprising:

• instructions to position an illumination device proximate to a first side of a mask on which a pattern is formed;
• instructions to position a gradient refractive index lens array between the mask and an exposed substrate, wherein the exposed substrate is proximate to a second side of the mask;
• instructions to move the gradient refractive index array across an area of the exposed substrate in a first direction on a two dimensional plane that is parallel to the exposed substrate;
• instructions to move the gradient refractive index lens array across the area of the exposed substrate in a second direction on the two dimensional plane to increase uniformity of provide exposure of the exposed substrate to a projection of the pattern, wherein the second direction is perpendicular to the first direction.