Thermal flux annealing influence of buried species

An apparatus for linearly focused annealing of buried species comprising:

• an electromagnetic radiation source;
• a stage having dimensions adapted for accommodating a semiconductor substrate within a chamber;
• an optical element disposed between the electromagnetic radiation source;
• and
• a controller coupled to the electromagnetic radiation source, the controller comprising machine readable program instructions or instruction logic that allow the controller to control a depth into which a substrate is exposed to the radiation, a species source to introduce a species into the substrate;
• and wherein the controller is configured to:
• translate linearly focused electromagnetic radiation continuously across a device side surface of the substrate in a first direction for a period of time sufficient to thermally influence the species to react with the semiconductor material within the substrate,
• wherein the electromagnetic radiation is focused from only one single continuously emitting electromagnetic radiation source to continuously extend linearly across a total diameter of the substrate in a form of a single continuously emitted line in a second direction different than the first direction during translating, and wherein during translating, the continuously emitted line comprises a laser that extends across the entire width of a wafer.