On-chip plasma charging sensor

A device for monitoring charging effects, the device comprising:

• a semiconductor substrate having a region doped with a first type conductivity;
• a first doped region, a second doped region, and a third doped region spaced apart in the doped region of the semiconductor substrate, the first, second, and third doped regions having a second type conductivity different from the first type conductivity;
• a dielectric layer overlying the doped region;
• a first gate structure overlying a first portion of the dielectric layer and having the first doped region on one side and the second doped region on the other side;
• a second gate structure overlying a second portion of the dielectric layer and having the second doped region on one side and the third doped region on the other side, the second gate structure being characterized by a first surface area;
• and
• a conductive layer electrically coupled to the second gate structure and being configured to collect charges, the conductive layer being characterized by a second surface area;
• wherein:
• the first gate structure is connected to a conductor for coupling to a gate bias voltage;
• the second gate structure has no electrical connection to any operating signal and power/ground supply voltages;
• and
• the second doped region is commonly shared by the first and second gate structures and has a positive electric charge disposed on one side and a negative electric charge disposed on an opposite side.