Method of manufacturing substrate for photovoltaic cell
AssigneeSamsung Corning Precision Materials Co., Ltd.
InventorsYoungZo Yoo, SeoHyun Kim, Gun Sang Yoon
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Abstract
A method of manufacturing a substrate for a photovoltaic cell, in which the high optical characteristic in a long-wavelength range available for the photovoltaic cell can be maintained, and at the same time, the amount of hazing can be increased. The method includes the step of forming a zinc oxide (ZnO) thin film layer doped with a dopant on a transparent substrate, and the step of controlling the surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma.
Claims10
A method of manufacturing a substrate for a photovoltaic cell, comprising:
- forming a zinc oxide thin film layer doped with a dopant on a transparent substrate;
- and
- controlling a surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma having an intensity,
- wherein the hydrogen plasma selectively etches a (11-20) plane of the zinc oxide thin film layer, and
- wherein the intensity of the hydrogen plasma is adjusted by application of radio-frequency power in a range from 10 W to 800 W.
Dependencies are inferred from the claim text.