Resist pattern-forming method, and radiation-sensitive resin composition

A resist pattern-forming method comprising:

• coating a radiation-sensitive resin composition on a substrate to provide a resist film;
• exposing the resist film;
• and
• developing the exposed resist film using a developer solution comprising no less than 80% by mass of an organic solvent,
• wherein, the radiation-sensitive resin composition comprises:
• a polymer which has a weight average molecular weight in terms of the polystyrene equivalent of greater than 6,000 and comprises a first structural unit that includes an acid-labile group, and less than 5 mol % or 0 mol % of a second structural unit that includes a hydroxyl group;
• a radiation-sensitive acid generator;
• and
• an acid diffusion controller which includes a compound having an amide group, a photodegradable base.