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US 8,795,946 B2Granted
Polymerizable ester compound, polymer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji Hasegawa, Masayoshi Sagehashi, Yuuki Suka, Masashi Ilo
Life of this patent
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Abstract
Polymerizable ester compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.
Claims9
A polymerizable ester compound having the general formula (2):
- wherein Rl is hydrogen, fluorine, methyl or trifluoromethyl, R3 is hydrogen or a C1-C15 straight, branched or cyclic, monovalent hydrocarbon group, and R4 is a C1-C15 straight, branched or cyclic, monovalent hydrocarbon group in which a constituent —CH2— may be substituted by —O— or —C(═O)—.
A polymer comprising recurring units having the general formula (2b):
- wherein R1 is hydrogen, fluorine, methyl, or trifluoromethyl,
- R3 is hydrogen or a C1-C15 straight, branched, or cyclic, monovalent hydrocarbon group, and
- R4 is a C1-C15 straight, branched, or cyclic, monovalent hydrocarbon group in which a constituent —CH2— may be substituted by —O— or —C(═O)—.
Dependencies are inferred from the claim text.