Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
AssigneeFUJIFILM Corporation
InventorsKana Fujii, Takamitsu Tomiga, Toru Fujimori
Life of this patent
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Abstract
An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.
Claims16
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- (A) a resin capable of decomposing by an action of an acid to increase the solubility of the resin (A) in an alkali developer, the resin (A) containing a phenolic hydroxyl group and a repeating unit having an aromatic group;
- (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation;
- (C) a basic compound;
- and
- (D) a compound represented by formula (D1):
- wherein A represents an r-valent hydrocarbon group having a carbon number of 1;
- R represents a hydrocarbon group and when a plurality of R's are present, the plurality of R's may be the same or different;
- n represents an integer of 1 to 3;
- m represents 1 or 2;
- r represents an integer of 2 to 4;
- and
- o represents an integer of 0 to 2.
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- (A) a resin capable of decomposing by an action of an acid to increase the solubility of the resin (A) in an alkali developer, the resin (A) containing a phenolic hydroxyl group and a repeating unit having an aromatic group;
- (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation;
- (C) a basic compound;
- and
- (D) a compound represented by formula (D1):
- wherein A represents an r-valent hydrocarbon group;
- R represents a hydrocarbon group and when a plurality of R's are present, the plurality of R's may be the same or different;
- n represents an integer of 1 to 3;
- m represents 1 or 2;
- r represents an integer of 2 to 4;
- o represents an integer of 0 to 2;
- and
- wherein the compound (D) is a compound represented by any of the following formulae:
Dependencies are inferred from the claim text.