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US 8,795,944 B2Granted
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
AssigneeFUJIFILM Corporation
InventorsHiroshi Saegusa, Kaoru Iwato, Shuji Hirano, Yusuke Iizuka
Life of this patent
Estimating the term…
Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.
Claims28
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid,
- (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and
- (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom,
- wherein the repeating unit (c) has at least either a fluorine atom or a silicon atom;
- and
- wherein:
- (i) the repeating unit (c) is (c′) repeating unit having a fluorine atom and a polarity conversion group on one side chain;
- (ii) the resin (A) contains no fluorine atom and no silicon atom;
- and
- (iii) the amount of the resin (A) is 70 to 98 mass% based on the entire solids content of the resin composition.
7 more elements
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid,
- (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and
- (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom,
- wherein the repeating unit (c) has at least either a fluorine atom or a silicon atom;
- wherein the acid generated from the compound (B) upon irradiation with an actinic ray or radiation has a molecular weight of 300 or more and contains a monocyclic or polycyclic, alicyclic or aromatic ring which may contain a heteroatom;
- wherein the repeating unit (c) is (c′) repeating unit having at least either a fluorine atom or a silicon atom and a polarity conversion group on one side chain.
3 more elements
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid,
- (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and
- (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom,
- wherein the repeating unit (c) has at least either a fluorine atom or a silicon atom;
- and
- wherein:
- (i) the repeating unit (c) is (c′) repeating unit having at least either a fluorine atom or a silicon atom and a polarity conversion group on one side chain;
- (ii) the resin (A) contains no fluorine atom and no silicon atom;
- and
- (iii) the amount of the resin (A) is 70 to 98 mass % based on the entire solids content of the resin composition;
- (iv) the resin A contains a repeating unit represented by formula (AI):
- wherein Xa1 represents a hydrogen atom, a methyl group which may have a substituent, or a group represented by —CH2—R9, wherein R9 represents a hydroxyl group or a monovalent organic group, T represents a single bond or a divalent linking group, each of Rx1 to Rx3 independently represents a linear or branched alkyl group or a monocyclic or polycyclic cycloalkyl group, and two members out of Rx1 to Rx3 may combine to form a monocyclic or polycyclic cycloalkyl group;
- and
- (v) the resin (A) contains, as the repeating unit represented by formula (AI), at least two kinds of repeating units represented by formula (1) or both a repeating unit represented by formula (1) and a repeating unit represented by formula (2):
- wherein each of R1 and R3 independently represents a hydrogen atom, a methyl group which may have a substituent, or a group represented by —CH2—R9, wherein R9 represents a hydroxyl group or a monovalent organic group, each of R2, R4, R5 and R6 independently represents an alkyl group or a cycloalkyl group, and R represents an atomic group necessary for forming an alicyclic structure together with the carbon atom.
12 more elements
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid,
- (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and
- (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom, wherein the repeating unit (c) has at least either a fluorine atom or a silicon atom;
- and
- wherein:
- (i) the repeating unit (c) is (c′) repeating unit having at least either a fluorine atom or a silicon atom and a polarity conversion group on one side chain;
- (ii) the resin (A) contains no fluorine atom and no silicon atom;
- (iii) the amount of the resin (A) is 70 to 98 mass % based on the entire solids content of the resin composition;
- (iv) the acid generated from the compound (B) upon irradiation with an actinic ray or radiation has a molecular weight of 300 or more and contains a monocyclic or polycyclic, alicyclic or aromatic ring which may contain a heteroatom;
- and
- (v) the compound (B) is a compound represented by formula (I):
- wherein X+ represents an organic counter ion, and R represents an organic group.
9 more elements
Dependencies are inferred from the claim text.