Method for providing a respective flat working layer on each of the two working disks of a double-side processing apparatus
AssigneeSiltronic AG
InventorGeorg Pietsch
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AssigneeSiltronic AG
InventorGeorg Pietsch
Estimating the term…
A method provides a respective flat working layer on each of two working disks of a double-side processing apparatus including a ring-shaped upper working disk, a ring shaped lower working disk and a rolling apparatus that are rotatably mounted about an axis of symmetry of the double-side processing apparatus. The method includes applying a lower intermediate layer and upper intermediate layer on respective surfaces of the lower and upper working disks. Then, simultaneous leveling of both intermediate layers is performed by moving trimming apparatuses on cycloidal paths over the intermediate layers using the rolling apparatus and the respective outer toothing under pressure and with addition of a cooling lubricant, so as to provide a material removal from the intermediate layers. A lower working layer of uniform thickness is then applied to the lower intermediate layer and an upper working layer of uniform thickness is applied to the upper intermediate layer.
A method for providing a respective flat working layer on each of two working disks of a double-side processing apparatus including a ring-shaped upper working disk, a ring shaped lower working disk and a rolling apparatus, with each of the working disks and the rolling apparatus being rotatably mounted about an axis of symmetry of the double-side processing apparatus, the method comprising each of the following steps in the stated order:
Dependencies are inferred from the claim text.