Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
AssigneeCentral Glass Company, Limited
InventorsKazunori Mori, Satoru Narizuka, Fumihiro Amemiya, Masaki Fujiwara
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Abstract
According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
Claims10
A polymerizable fluorine-containing sulfonic acid or sulfonate having an anion structure of the following general formula (1):
- where
- A each independently represent a hydrogen atom, a fluorine atom or a trifluoromethyl group;
- n represents an integer of 1 to 10;
- W represents a divalent linking group selected from the group consisting of substituted or unsubstituted methylene groups and substituted or unsubstituted divalent alicyclic hydrocarbon groups;
- or a divalent linking group formed by combination of one kind or two or more kinds selected from the group consisting of substituted or unsubstituted methylene groups and substituted or unsubstituted divalent alicyclic hydrocarbon groups;
- any number of hydrogen atoms bonded to carbon atoms of the divalent linking group may be substituted with a fluorine atom;
- any carbon atoms may form a ring with or without a substituent in the divalent linking group;
- and
- R1 represents an acid labile group.
A production method of a polymerizable fluorine-containing sulfonic acid onium salt of the general formula (2), comprising causing condensation of an acrylic acid derivative of the following general formula (15) and a hydroxyalkanesulfonic acid onium salt of the following general formula (16) in the presence of a base catalyst,
- where
- W represents a divalent linking group selected from the group consisting of substituted or unsubstituted methylene groups and substituted or unsubstituted divalent alicyclic hydrocarbon groups;
- or a divalent linking group formed by combination of one kind or two or more kinds selected from the group consisting of substituted or unsubstituted methylene groups and substituted or unsubstituted divalent alicyclic hydrocarbon groups;
- any number of hydrogen atoms bonded to carbon atoms of the divalent linking group may be substituted with a fluorine atom;
- any carbon atoms may form a ring with or without a substituent in the divalent linking group;
- R1 represent an acid labile group;
- and
- B represents a halogen atom or a leaving group,
- where A each independently represent a hydrogen atom, a fluorine atom or a trifluoromethyl group;
- n represents an integer of 1 to 10;
- X+represents either a sulfonium cation of the following general formula (a) or a iodonium cation of the following general formula (b):
- where R2, R3 and R4 each independently represent a substituted or unsubstituted C1-C20 alkyl, alkenyl or oxoalkyl group or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group;
- and two or more of R2, R3 and R4 may be bonded together to form a ring with a sulfur atom in the formula,
- where R5 and R6 each independently represent a substituted or unsubstituted C1-C20 alkyl, alkenyl or oxoalkyl group or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group;
- and R5 and R6 may be bonded together to form a ring with a iodine atom in the formula,
- where A, n, W, R1 and X′ have the same definitions as in the general formulas (15) and (16).
Dependencies are inferred from the claim text.