# US 8,786,826 B1 · Arrangement for actuating an element in a microlithographic projection exposure apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,786,826 B1 - Document ID: US8786826B1 - Status: Granted - Kind: B1 - Application number: 14/157,718 - Filed: 2014-01-17 - Published: 2014-07-24 - Granted: 2014-07-22 - Earliest claimed: 2013-01-24 - Assignees: Carl Zeiss SMT GmbH - Applicants: Carl Zeiss SMT GmbH - Inventors: Sascha Bleidistel; Ulrich Schoenhoff; Juergen Fischer - Web page: https://patentgrep.com/patent/US8786826B1 ## CPC - G03F 7/70191: {Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like} - G02B 5/0891: {Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06)} - G02B 7/181: {with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation} - G02B 26/0825: {the reflecting element being a flexible sheet or membrane, e.g. for varying the focus (flexible mirrors for cosmetic use A45D42/24)} - G02B 27/0068: {having means for controlling the degree of correction, e.g. using phase modulators, movable elements (controlling the phase of light using moving or deformable elements G02B26/06)} - G03F 7/7015: {Details of optical elements} - G03F 7/702: {Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems} - G03F 7/70233: {Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems} - G03F 7/70266: {Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction} - G03F 7/70308: {Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift} - G03F 7/70825: {Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707)} - G03F 7/709: {Vibration, e.g. vibration detection, compensation, suppression or isolation} - G02B 7/005: {Motorised alignment} - G02B 7/185: with means for adjusting the shape of the mirror surface - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS ## Abstract The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the ac-tuators is arranged in a node of at least one natural vibration mode of the optical element. ## Claims ### Claim 1 An arrangement, comprising: a deformable optical element configured so that an adjustable force is transmittable to the deformable optical element in a first number of degrees of freedom, the deformable optical element being actively deformable by actuators; a second number of actuators, each actuator being coupled to the deformable optical element via a mechanical coupling to transmit a force to the deformable optical element in at least one of the degrees of freedom, the second number being greater than the first number; and a position controller configured to drive the second number of actuators based on a static transformation matrix and a driving signal for the deformation of the deformable optical element, the elements of the static transformation matrix being such that the second number of actuators actuate only translational and/or rotational rigid-body degrees of freedom of the deformable optical element. ### Claim 2 (depends on 1) The arrangement of claim 1, wherein at least one of the actuators is arranged at a node of at least one natural vibration mode of the deformable optical element. ### Claim 3 (depends on 2) The arrangement of claim 2, wherein the elements of the static transformation matrix are such that the second number of actuators do not excite a bending mode of the deformable optical element. ### Claim 4 (depends on 2) The arrangement of claim 2, wherein the position controller is configured to generate the static transformation matrix. ### Claim 5 (depends on 2) The arrangement of claim 2, further comprising position sensors configured to determine a position of the deformable optical element during actuation of the second number of actuators. ### Claim 6 (depends on 2) The arrangement of claim 2, wherein, during use of the arrangement, a resultant static transformation matrix is provided to the position controller. ### Claim 7 (depends on 1) The arrangement of claim 1, wherein the actuators are configured so that actuation in the degrees of freedom is substantially orthogonal to at least one natural vibration mode of the deformable optical element. ### Claim 8 (depends on 7) The arrangement of claim 7, wherein the elements of the static transformation matrix are such that the second number of actuators do not excite a bending mode of the deformable optical element. ### Claim 9 (depends on 7) The arrangement of claim 7, wherein the position controller is configured to generate the static transformation matrix. ### Claim 10 (depends on 7) The arrangement of claim 7, further comprising position sensors configured to determine a position of the deformable optical element during actuation of the second number of actuators. ### Claim 11 (depends on 7) The arrangement of claim 7, wherein, during use of the arrangement, a resultant static transformation matrix is provided to the position controller. ### Claim 12 (depends on 1) The arrangement of claim 1, wherein the deformable optical element is actively deformable to compensate for a disturbance. ### Claim 13 (depends on 1) The arrangement of claim 1, wherein the deformable optical element is a deformable mirror. ### Claim 14 (depends on 1) The arrangement of claim 1, further comprising a third number of sensor elements configured to determine: a) a location of the optical element; and/or b) a position of the optical element. ### Claim 15 (depends on 14) The arrangement of claim 14, wherein the third number is greater than the first number. ### Claim 16 (depends on 1) The arrangement of claim 1, wherein at least one of the actuators comprises a Lorentz actuator. ### Claim 17 (depends on 1) The arrangement of claim 1, wherein the first number is at least three. ### Claim 18 (depends on 1) The arrangement of claim 1, wherein the first number is six. ### Claim 19 (depends on 1) The arrangement of claim 1, wherein the arrangement is configured so that the optical element is actively deformable via the adjustable force. ### Claim 20 (depends on 1) The arrangement of claim 1, wherein the arrangement is configured so that a position of the optical element is manipulable via the adjustable force. ### Claim 21 (depends on 1) An apparatus, comprising: the arrangement of claim 1, wherein the apparatus is a microlithographic projection exposure apparatus. ### Claim 22 (depends on 21) The apparatus of claim 21, wherein the microlithographic projection exposure apparatus is an EUV microlithographic projection exposure apparatus. ### Claim 23 (depends on 1) The arrangement of claim 1, wherein the elements of the static transformation matrix are such that the second number of actuators do not excite a bending mode of the deformable optical element. ### Claim 24 (depends on 1) The arrangement of claim 1, wherein the position controller is configured to generate the static transformation matrix. ### Claim 25 (depends on 1) The arrangement of claim 1, further comprising position sensors configured to determine a position of the deformable optical element during actuation of the second number of actuators. ### Claim 26 (depends on 1) The arrangement of claim 1, wherein, during use of the arrangement, a resultant static transformation matrix is provided to the position controller. ### Claim 27 (depends on 1) An apparatus, comprising: an illumination device; and a projection lens, wherein the apparatus comprises an arrangement according to claim 1, and the apparatus is a microlithographic projection exposure apparatus. ### Claim 28 (depends on 27) The apparatus of claim 27, wherein the illumination device includes the arrangement. ### Claim 29 (depends on 1) A lens, comprising: an arrangement according to claim 1, wherein the lens is a microlithographic projection lens.