# US 8,786,823 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,786,823 B2 - Document ID: US8786823B2 - Status: Granted - Kind: B2 - Application number: 12/960,947 - Filed: 2010-12-06 - Published: 2011-04-28 - Granted: 2014-07-22 - Earliest claimed: 2005-11-16 - Assignees: ASML Netherlands B.V. - Applicants: Martinus Hendrikus Antonius Leenders; Nicolaas Rudolf Kemper; Joost Jeroen Ottens - Inventors: Martinus Hendrikus Antonius Leenders; Nicolaas Rudolf Kemper; Joost Jeroen Ottens - Web page: https://patentgrep.com/patent/US8786823B2 ## CPC - G03F 7/70866: {of mask or workpiece} - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased. ## Claims ### Claim 1 A lithographic apparatus, comprising: a projection system; a table configured to hold a substrate to be imaged by the projection system; and a liquid supply system configured to provide a space between the projection system and the substrate with liquid, at least a part of the liquid supply system being moveable relative to and independent of the projection system and the substrate; and a controller configured to control the amount of supply of the liquid based on direction of movement of the at least part of the liquid supply system. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the controller is configured to, when the at least part of the liquid supply system is moving towards the projection system from a first side to a second side, control the liquid supply system to provide more liquid from the side of the at least part of the liquid supply system closer to the second side than from a part of the at least part of the liquid supply system closer to the first side. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the liquid supply system has an outlet to supply the liquid substantially parallel to a top surface of the substrate and the controller is configured to control supply of the liquid from the outlet. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the controller is configured to control the supply of liquid based on the direction of movement of the at least part of the liquid supply system relative to the projection system. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein the at least part of the liquid supply system is moveable in at least one direction which is substantially parallel to a top surface of the substrate. ### Claim 6 (depends on 1) The apparatus of claim 1, further comprising an actuator configured to move the at least a part of the liquid supply system in the at least one direction. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein, in use, a boundary of the liquid extends between the substrate and the at least a part of the liquid supply system. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein the liquid supply system is configured to provide liquid to an area of the substrate which is, in plan, smaller than a top surface of the substrate. ### Claim 9 (depends on 1) The apparatus of claim 1, further comprising a positional controller configured to control movement of the at least part of the liquid supply system such that, during a portion of movement of the substrate relative to the projection system during imaging, the at least part of the liquid supply system is moved to reduce relative velocity between the at least part of the liquid supply system and the substrate, while maintaining the space between the projection system and the substrate substantially full of liquid. ### Claim 10 A device manufacturing method, comprising: supplying a liquid between a projection system and a substrate using a liquid supply system; using the projection system to project a patterned beam of radiation onto the substrate through the liquid; moving the substrate under the projection system; moving at least a part of the liquid supply system relative to and independent of the projection system and the substrate; and controlling the amount of supply of the liquid based on direction of movement of the at least part of the liquid supply system. ### Claim 11 (depends on 10) The method of claim 10, wherein the controlling comprises, when the at least part of the liquid supply system is moving towards the projection system from a first side to a second side, controlling supply of the liquid to provide more liquid from the side of the at least part of the liquid supply system closer to the second side than from a part of the at least part of the liquid supply system closer to the first side. ### Claim 12 (depends on 10) The method of claim 10, wherein the liquid supply system has an outlet to supply liquid substantially parallel the substrate and the controlling controls supply of liquid from the outlet. ### Claim 13 (depends on 10) The method of claim 10, wherein the controlling comprises controlling the supply of liquid based on the direction of movement of the at least part of the liquid supply system relative to the projection system. ### Claim 14 (depends on 10) The method of claim 10, wherein during moving of the substrate, moving the at least part of the liquid supply system in a direction and at a speed to reduce the relative velocity between the substrate and the at least part of the liquid supply system. ### Claim 15 (depends on 10) The method of claim 10, wherein a boundary of the liquid extends between the substrate and the at least part of the liquid supply system. ### Claim 16 A computer-readable non-transitory storage medium having a computer program stored therein to cause a computer to execute a method comprising: using a projection system to project a patterned beam of radiation onto a substrate through a liquid between the projection system and the substrate; moving at least a part of a liquid supply system relative to and independent of the projection system and the substrate, the liquid supply system used to supply the liquid between the projection system and the substrate; and controlling the amount of supply of the liquid by the liquid supply system based on direction of movement of the at least part of the liquid supply system. ### Claim 17 (depends on 16) The storage medium of claim 16, wherein the controlling comprises, when the at least part of the liquid supply system is moving towards the projection system from a first side to a second side, controlling supply of the liquid to provide more liquid from the side of the at least part of the liquid supply system closer to the second side than from a part of the at least part of the liquid supply system closer to the first side. ### Claim 18 (depends on 16) The storage medium of claim 16, wherein the controlling comprises controlling the supply of liquid based on the direction of movement of the at least part of the liquid supply system relative to the projection system. ### Claim 19 (depends on 16) The storage medium of claim 16, wherein the liquid supply system has an outlet to supply liquid substantially parallel the substrate and the controlling comprises controlling supply of liquid from the outlet. ### Claim 20 (depends on 16) The storage medium of claim 16, wherein the moving comprising moving the at least part of the liquid supply system in at least one direction which is substantially parallel to a top surface of the substrate.