# US 8,786,015 B2 · Super-junction semiconductor device

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- Number: US 8,786,015 B2
- Document ID: US8786015B2
- Status: Granted
- Kind: B2
- Application number: 13/369,413
- Filed: 2012-02-09
- Published: 2012-08-23
- Granted: 2014-07-22
- Earliest claimed: 2011-02-17
- Assignees: Fuji Electric Co., Ltd.
- Applicants: Takahiro Tamura; Yasuhiko Onishi
- Inventors: Takahiro Tamura; Yasuhiko Onishi
- Web page: https://patentgrep.com/patent/US8786015B2

## CPC

- H10D 62/127: {of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs}
- H10D 10/421: {having both emitter-base and base-collector junctions ending at the same surface of the body}
- H10D 12/441: {Vertical IGBTs}
- H10D 30/669: {having voltage-sensing or current-sensing structures, e.g. emulator sections or overcurrent sensing cells}
- H10D 62/111: {Multiple RESURF structures, e.g. double RESURF or 3D-RESURF structures}
- H10D 62/393: {Body regions of DMOS transistors or IGBTs (cell layout of DMOS H10D62/127)}
- H10D 64/111: {Field plates}
- H10D 64/252: {for vertical or pseudo-vertical devices}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

A super-junction semiconductor device includes a drift layer including an alternating-conductivity-type layer that includes n-type region and p-type region arranged alternately in parallel to the first major surface of an n-type substrate. These alternating regions extend deep in a direction perpendicular to the first major surface. The first major surface includes a main device region with a gate electrode and a main source electrode and sensing device region with a gate electrode and a sensing source electrode. There is a common drain electrode on the second major surface of the substrate. There is a separation region between the main device region and the sensing device region. It includes an n-type region and p-type regions in the n-type region. The p-type regions are in an electrically floating state in the directions parallel and perpendicular to the first alternating-conductivity-type layer.

## Claims

### Claim 1

A superjunction-semiconductor device comprising:
a semiconductor substrate layer of a first conductivity type;
a drift layer comprising a first alternating-conductivity-type layer comprising a first semiconductor region of the first conductivity type and a second semiconductor region of a second conductivity type, the first and second semiconductor regions both being longer than they are wide in a direction perpendicular to a first major surface of the semiconductor layer of the first conductivity type, the first and second semiconductor regions being arranged alternately so that they adjoin each other in parallel to a first major surface of the semiconductor layer of the first conductivity type, so that they adjoin other in parallel to the first major surface of the semiconductor layer of the first conductivity type;
a main device region and a sensing device region of which the drift layer is the first parallel pn layer, located on a first major surface side;
the main device region comprising a main gate electrode and a main source electrode;
the sensing device region comprising a sensing device cell comprising a sensing gate electrode and a sensing source electrode; and
a separation region disposed between the drift layer of the main device region and the drift layer of the sensing region to separate the main device region and the sensing device region, the separation region comprising a third semiconductor region of the first conductivity type and a fourth semiconductor of the second conductivity type, the fourth semiconductor regions being arranged in the third semiconductor region in parallel and perpendicular to the first alternating conductivity-type layer, the fourth semiconductor region being separated from the second semiconductor region of the main device region and the second semiconductor region of the sensing device region and being in an electrically floating state
wherein the separation region is disposed entirely between the main device region and the sensing device region, the breakdown withstanding section is provided in the peripheral region of the main device region, and the entire fourth semiconductor region is in a floating state.

### Claim 2 (depends on 1)

The super-junction semiconductor device according to claim 1, wherein the first conductivity-type drain layer is formed on the second major surface of the first conductivity-type semiconductor layer, and a common drain electrode which is a drain electrode for each of the main device region and the temperature sensing region is formed on the upper surface of the drain layer.

### Claim 3 (depends on 2)

The super-junction semiconductor device according to claim 2, wherein, in OFF-state, depletion layers respectively expand in the boundary between the second semiconductor region of the main device region and the third semiconductor region of the separation region and the boundary between the second semiconductor region of the sensing region and the third semiconductor region of the separation region.

### Claim 4 (depends on 3)

The super-junction semiconductor device according to claim 3, wherein, in OFF-state, depletion layers expand to the entire of the first parallel pn layer and the second parallel pn layer.

### Claim 5 (depends on 3)

The super-junction semiconductor device according to claim 3, wherein the separation region comprises a second alternating-conductivity-type layer, in which the fourth semiconductor regions are arranged in the third semiconductor region in a planer lattice pattern.

### Claim 6 (depends on 5)

The super-junction semiconductor device according to claim 5, wherein the first alternating-conductivity-type layer in the main device region and the sensing device region comprises a planar stripe pattern.

### Claim 7 (depends on 3)

The super-junction semiconductor device according to claim 3, wherein a repeating pitch of the second alternating-conductivity-type layer is less than a repeating pitch of the first alternating-conductivity type layer.

### Claim 8 (depends on 3)

The super-junction semiconductor device according to claim 3, wherein the first alternating-conductivity-type layer in the main device region and the sensing device region comprises a planar stripe pattern, and wherein the separation region comprises a second alternating-conductivity-type layer, in which the fourth semiconductor regions are arranged in the third semiconductor region in a planer lattice pattern.