# US 8,785,972 B2 · Semiconductor electrostatic protection circuit device

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- Number: US 8,785,972 B2
- Document ID: US8785972B2
- Status: Granted
- Kind: B2
- Application number: 13/781,263
- Filed: 2013-02-28
- Published: 2013-09-05
- Granted: 2014-07-22
- Earliest claimed: 2012-03-02
- Assignees: Renesas Electronics Corporation
- Applicants: Renesas Electronics Corporation
- Inventors: Yasuyuki Morishita
- Web page: https://patentgrep.com/patent/US8785972B2

## CPC

- H10D 89/713: {including a PNP transistor and a NPN transistor, wherein each of said transistors has its base region coupled to the collector region of the other transistor, e.g. silicon controlled rectifier [SCR] devices}
- H10D 18/00: Thyristors
- H10D 18/251: {Lateral thyristors}
- H10D 62/126: {Top-view geometrical layouts of the regions or the junctions}
- H10D 62/115: {Dielectric isolations, e.g. air gaps}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

An electrostatic protection circuit in a semiconductor device includes a first first-conductivity type well extending in a first direction over a semiconductor substrate, a second first-conductivity type well extending in a second direction over the semiconductor substrate and perpendicular to the first direction with one end coupled to a first long side of the first first-conductivity type well, and a second-conductivity type well formed around the first first-conductivity type well and the second first-conductivity type well. It also includes a first high-concentration second-conductivity type region extending in the second direction on a surface of the second first-conductivity type well and a first high-concentration first-conductivity type region extending in the second direction on a surface of the second-conductivity type well while facing the first high-concentration second-conductivity type region.

## Claims

### Claim 1

A semiconductor electrostatic protection circuit device, comprising:
a first first-conductivity type well extending in a first direction over a semiconductor substrate of the semiconductor electrostatic protection circuit device, the first first-conductivity type well having a first long side and a second long side opposite the first long side;
at least one second first-conductivity type well extending in a second direction over the semiconductor substrate and perpendicular to the first direction with one end coupled to the second long side of the first first-conductivity type well;
a second-conductivity type well formed over the substrate and enclosing the first first-conductivity type well and the at least one second first-conductivity type well;
at least one first high-concentration second-conductivity type region extending in the second direction on a surface of the second first-conductivity type well; and
at least one first high-concentration first-conductivity type region extending in the second direction on a surface of the second-conductivity type well, the first high-concentration first-conductivity type region facing the first high-concentration second-conductivity type region.

### Claim 2 (depends on 1)

The semiconductor electrostatic protection circuit device according to claim 1, further comprising:
a second high-concentration first-conductivity type region extending in the first direction as a first trigger tap region on a surface of the first first-conductivity type well.

### Claim 3 (depends on 2)

The semiconductor electrostatic protection circuit device according to claim 2, comprising:
a plurality of the at least one second first-conductivity type well,
a plurality of the at least one first high-concentration second-conductivity type region, and
a plurality of the at least one first high-concentration first-conductivity type region.

### Claim 4 (depends on 3)

The semiconductor electrostatic protection circuit device according to claim 3, further comprising:
a second high-concentration second-conductivity type region extending in the first direction as a second trigger tap region on the surface of the second-conductivity type well, the second high-concentration second-conductivity type region facing the second high-concentration first-conductivity type region with the second first-conductivity type wells sandwiched therebetween.

### Claim 5 (depends on 3)

The semiconductor electrostatic protection circuit device according to claim 3, having a layout such that each of the first high-concentration second conductivity type regions has:
a long side which faces a long side of at least one of the first high-concentration first-conductivity type regions; and
a short side which faces a long side of the second high-concentration first-conductivity type region serving as the first trigger tap region.

### Claim 6 (depends on 2)

The semiconductor electrostatic protection circuit device according to claim 2, further comprising:
at least one third first-conductivity type well extending in the second direction and having one end coupled to the first long side of the first first-conductivity-type well;
at least one third high-concentration second-conductivity type region extending in the second direction on a surface of the third first-conductivity type well; and
at least one third high-concentration first-conductivity type region extending in the second direction on the surface of the second-conductivity type well, the third high-concentration first-conductivity type region facing the third high-concentration second-conductivity type region, wherein the second-conductivity type well is formed over the substrate and encloses the first first-conductivity type well, the at least one second first-conductivity type well, and the at least one third first-conductivity type well.

### Claim 7 (depends on 6)

The semiconductor electrostatic protection circuit device according to claim 6, comprising:
a plurality of the at least one second first-conductivity type well,
a plurality of the at least one first high-concentration second-conductivity type region,
a plurality of the at least one first high-concentration first-conductivity type region,
a plurality of the at least one third first-conductivity type well,
a plurality of the at least one third high-concentration second-conductivity type region, and
a plurality of the at least one third high-concentration first-conductivity type region.

### Claim 8 (depends on 7)

The semiconductor electrostatic protection circuit device according to claim 7, further comprising:
a second high-concentration second-conductivity type region extending in the first direction as a second trigger tap region on the surface of the second-conductivity type well, the second high-concentration second-conductivity type region facing the second high-concentration first-conductivity type region with the second first-conductivity type wells sandwiched therebetween; and
a fourth high-concentration second-conductivity type region extending in the first direction as a third trigger tap region on the surface of the second-conductivity type well, the fourth high-concentration second-conductivity type region facing the second high-concentration first-conductivity type region with the third first-conductivity type wells sandwiched therebetween.

### Claim 9 (depends on 6)

The semiconductor electrostatic protection circuit device according to claim 6, wherein:
the first high-concentration first-conductivity type region extends parallel to, and for the same length as, the first high-concentration second-conductivity type region; and
the third high-concentration first-conductivity type region extends parallel to, and for the same length as, the third high-concentration second-conductivity type region.

### Claim 10 (depends on 2)

The semiconductor electrostatic protection circuit device according to claim 2, having a layout such that:
an SCR current ISCR is configured to flow, along the first direction, from the first high-concentration second-conductivity type region to the first high-concentration first-conductivity type region; and
a trigger current Itrig is configured to flow, along the second direction, from the first high-concentration second-conductivity type region to the second high-concentration first-conductivity type region.

### Claim 11 (depends on 1)

The semiconductor electrostatic protection circuit device according to claim 1, wherein:
the first high-concentration first-conductivity type region extends parallel to, and for the same length as, the first high-concentration second-conductivity type region.

### Claim 12

A semiconductor electrostatic protection circuit device, comprising:
a first first-conductivity type well extending in a first direction over a semiconductor substrate of the semiconductor electrostatic protection circuit device, the first first-conductivity type well having a first long side and a second long side opposite the first long side;
a plurality of second first-conductivity type wells extending in a second direction over the semiconductor substrate and perpendicular to the first direction with one end of each of the plurality of second first-conductivity type wells coupled to the second long side of the first first-conductivity type well;
a second-conductivity type well formed over the substrate and enclosing the first first-conductivity type well and the second first-conductivity type wells;
a plurality of first high-concentration second-conductivity type regions each extending in the second direction on a surface of each of the plurality of second first-conductivity type wells;
a plurality of first high-concentration first-conductivity type regions extending in the second direction on a surface of the second-conductivity type well with each of the first high-concentration second-conductivity type regions being located next to at least one of the first high-concentration first-conductivity type regions; and
a second high-concentration first-conductivity type region extending in the first direction as a first trigger tap region on a surface of the first first-conductivity type well.

### Claim 13 (depends on 12)

The semiconductor electrostatic protection circuit device according to claim 12, wherein:
each of the first high-concentration second-conductivity type regions is between two of the first high-concentration first-conductivity type regions.

### Claim 14 (depends on 13)

The semiconductor electrostatic protection circuit device according to claim 13, wherein:
each of the first high-concentration second-conductivity type regions has a long side which faces, and extends parallel to, two of said plurality of first high-concentration first-conductivity type regions.

### Claim 15 (depends on 12)

The semiconductor electrostatic protection circuit device according to claim 12, having a layout such that:
an SCR current ISCR is configured to flow, along the first direction, from each of the first high-concentration second-conductivity type regions to at least one of the first high-concentration first-conductivity type regions; and
a trigger current Itrig is configured to flow, along the second direction, from each of the first high-concentration second-conductivity type regions to the second high-concentration first-conductivity type region.

### Claim 16 (depends on 12)

The semiconductor electrostatic protection circuit device according to claim 12, wherein:
the device has mirror symmetry about a line extending in the first direction through the first first-conductivity type well and the second high-concentration first-conductivity type region.

### Claim 17 (depends on 16)

The semiconductor electrostatic protection circuit device according to claim 16, having a layout such that:
an SCR current ISCR is configured to flow, along the first direction, from each of the first high-concentration second-conductivity type regions to at least one of the first high-concentration first-conductivity type regions; and
a trigger current Itrig is configured to flow, along the second direction, from each of the first high-concentration second-conductivity type regions to the second high-concentration first-conductivity type region.

### Claim 18 (depends on 12)

The semiconductor electrostatic protection circuit device according to claim 12, further comprising:
a second high-concentration second-conductivity type region extending in the first direction as a second trigger tap region on the surface of the second-conductivity type well, the second high-concentration second-conductivity type region facing the second high-concentration first-conductivity type region with the second first-conductivity type wells sandwiched therebetween.

### Claim 19 (depends on 18)

The semiconductor electrostatic protection circuit device according to claim 18, wherein:
the device has mirror symmetry about a line extending in the first direction through the first first-conductivity type well and the second high-concentration first-conductivity type region.

### Claim 20 (depends on 19)

The semiconductor electrostatic protection circuit device according to claim 19, having a layout such that:
an SCR current ISCR is configured to flow, along the first direction, from each of the first high-concentration second-conductivity type regions to at least one of the first high-concentration first-conductivity type regions; and
a trigger current Itrig is configured to flow, along the second direction, from each of the first high-concentration second-conductivity type regions to the second high-concentration first-conductivity type region.

### Claim 21

A semiconductor electrostatic protection circuit device, comprising:
a first first-conductivity type well extending in a first direction over a semiconductor substrate of the semiconductor electrostatic protection circuit device, the first first-conductivity type well having a first long side and a second long side opposite the first long side;
a plurality of first high-concentration second-conductivity type regions extending in a second direction perpendicular to the first direction over the semiconductor substrate;
a plurality of first high-concentration first-conductivity type regions extending in the second direction over the semiconductor substrate and facing at least one of the plurality of first high-concentration second-conductivity type regions;
a second high-concentration first-conductivity type region extending in the first direction as a first trigger tap region on a surface of the first first-conductivity type well; and
a second-conductivity type well formed over the substrate and enclosing the first first-conductivity type well and also the first high-concentration first-conductivity type regions;
wherein the electrostatic protection circuit device has a layout such that each of the first high-concentration second conductivity type regions has:
a long side which faces a long side of at least one of the first high-concentration first-conductivity type regions; and
a short side which faces a long side of the second high-concentration first-conductivity type region serving as the first trigger tap region.

### Claim 22 (depends on 21)

The semiconductor electrostatic protection circuit device according to claim 21, having the layout such that:
an SCR current ISCR is configured to flow, along the first direction, from each of the first high-concentration second-conductivity type regions to at least one of the first high-concentration first-conductivity type regions; and
a trigger current Itrig is configured to flow, along a second direction different from the first direction, from each of the first high-concentration second-conductivity type regions to the second high-concentration first-conductivity type region serving as first trigger tap region.
