Laser-produced-plasma EUV light source
AssigneeASML Netherlands B.V.
InventorsAlexander I. Ershov, Igor V. Fomenkov
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Abstract
Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
Claims12
A light source comprising:
- a system for generating a train of light pulses and delivering the light pulses into a chamber along a beam path, the system including a gain medium for amplifying light of a source wavelength;
- an optic within the chamber defining a first focus at an irradiation region and a second focus at an intermediate region;
- a target material delivery system delivering a target material to the irradiation region;
- and
- a multichannel structure within the chamber and disposed between the irradiation region and the intermediate region and including a plurality of conical shaped vanes.
A chamber system comprising:
- a multichannel structure supported within a chamber and disposed between an irradiation region and an intermediate region, defined by an optic that includes a first focus at the irradiation region and a second focus at the intermediate region, the multichannel structure comprising a plurality of concentric conical shaped vanes that are arranged to allow a train of light pulses generated from a system to travel from the optic to the intermediate region.
Dependencies are inferred from the claim text.