# US 8,785,809 B2 · Processing device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,785,809 B2 - Document ID: US8785809B2 - Status: Granted - Kind: B2 - Application number: 13/453,621 - Filed: 2012-04-23 - Published: 2012-08-16 - Granted: 2014-07-22 - Earliest claimed: 2006-03-06 - Assignees: Tokyo Electron Limited - Applicants: Toshihisa Nozawa; Tamaki Yuasa - Inventors: Toshihisa Nozawa; Tamaki Yuasa - Web page: https://patentgrep.com/patent/US8785809B2 ## CPC - H10P 72/0441: {Apparatus for sealing, encapsulating, glassing, decapsulating or the like} - C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps} - C23C 16/511: using microwave discharges - C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} - H01J 37/32834: {Exhausting} - H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)} - Y10T 137/85978: With pump - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus having an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof, a mounting table provided within the processing chamber for holding the target object, a pressure control valve connected to the gas exhaust port, the pressure control valve including a slide-type valve body for changing an area of an opening region of a valve port, and a gas exhaust system connected to the pressure control valve. The pressure control valve is arranged such that a center axis of the mounting table lies within an opening region of the pressure control valve formed over a practical use region of a valve opening degree of the pressure control valve. ## Claims ### Claim 1 A processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus comprising: an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof; a mounting table provided within the processing chamber for holding the target object; a pressure control valve connected to the gas exhaust port, the pressure control valve including a slide-type valve body for changing an area of an opening region of a valve port; and a gas exhaust system connected to the pressure control valve, wherein the pressure control valve is arranged such that a center axis of the mounting table lies within an opening region of the pressure control valve formed over at least part of a practical use region of a valve opening degree of the pressure control valve, and the gas exhaust port is formed eccentrically relative to the center axis of the mounting table. ### Claim 2 (depends on 1) The processing apparatus of claim 1, wherein the practical use region of the valve opening degree is in a range of 5 to 40%. ### Claim 3 (depends on 1) The processing apparatus of claim 1, wherein the center axis of the mounting table is positioned along a movement trajectory of a gravity center of gravity of the opening region of the pressure control valve in a plane defined by a plan view of the opening region of the pressure control valve. ### Claim 4 (depends on 1) The processing apparatus of claim 1, wherein the gas exhaust system includes a turbo molecular pump connected to the pressure control valve. ### Claim 5 (depends on 1) The processing apparatus of claim 1, wherein the valve body is rectilinearly slidable. ### Claim 6 (depends on 1) The processing apparatus of claim 1, wherein the valve body is curvilinearly and swingably slidable. ### Claim 7 (depends on 1) The processing apparatus of claim 1, wherein the mounting table is supported by a sidewall of the processing chamber through a support arm or supported on the bottom portion of the processing chamber through support legs. ### Claim 8 (depends on 7) The processing apparatus of claim 7, wherein the mounting table includes an electrostatic chuck connected to a radio frequency (RF) power supply for applying a RF power via a wiring line, and wherein the wiring line is provided through the support arm or the support legs. ### Claim 9 (depends on 1) The processing apparatus of claim 1, further comprising a gas supply unit provided above the mounting table for supplying a processing gas within the processing chamber. ### Claim 10 (depends on 9) The processing apparatus of claim 9, wherein the gas supply unit supplies the processing gas through a plurality of gas injection holes. ### Claim 11 (depends on 10) The processing apparatus of claim 10, wherein the gas supply unit includes a shower head portion, and the gas injection holes are formed in the shower head portion. ### Claim 12 (depends on 1) The processing apparatus of claim 1, wherein the mounting table is supported in a plurality of directions. ### Claim 13 (depends on 1) The processing apparatus of claim 1, wherein: the gas exhaust port has a center axis which is offset from the center axis of the mounting table; and a plan view of the opening region of the pressure control valve includes a center of gravity, and wherein the location of the center of gravity moves along a trajectory as the slide-type valve body moves and the size of the opening region of the pressure control valve changes. ### Claim 14 (depends on 13) The processing apparatus of claim 13, wherein the center axis of the mounting table is located along the trajectory of the center of gravity of the opening region. ### Claim 15 (depends on 14) The processing apparatus of claim 14, wherein the center axis of the mounting table is located along a portion of the trajectory of the center of gravity of the opening region, and wherein said portion of the trajectory corresponds to a path of movement of the center of gravity as the slide-type valve body moves from a 5% valve opening position to a 40% valve opening position. ### Claim 16 A processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus comprising: an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof; a mounting table provided within the processing chamber for holding the target object; a gas supply unit provided above the mounting table for supplying a processing gas within the processing chamber; a ceiling plate provided in the processing chamber for transmitting microwaves; a plasma generating unit for generating a plasma within the processing chamber, wherein a microwave generator is connected to the plasma generating unit via a waveguide tube, a pressure control valve connected to the gas exhaust port, the pressure control valve including a slide-type valve body for changing an area of an opening region of a valve port; and a gas exhaust system connected to the pressure control valve, wherein the pressure control valve is arranged such that a center axis of the mounting table lies within an opening region of the pressure control valve formed over at least part of a practical use region of a valve opening degree of the pressure control valve, and the gas exhaust port is formed eccentrically relative to the center axis of the mounting table. ### Claim 17 (depends on 16) The processing apparatus of claim 16, wherein the mounting table is supported in a plurality of directions. ### Claim 18 (depends on 16) The processing apparatus of claim 16, wherein: the gas exhaust port has a center axis which is offset from the center axis of the mounting table; and a plan view of the opening region of the pressure control valve includes a center of gravity, and wherein the location of the center of gravity moves along a trajectory as the slide-type valve body moves and the size of the opening region of the pressure control valve changes. ### Claim 19 (depends on 18) The processing apparatus of claim 18, wherein the center axis of the mounting table is located along the trajectory of the center of gravity of the opening region. ### Claim 20 (depends on 19) The processing apparatus of claim 19, wherein the center axis of the mounting table is located along a portion of the trajectory of the center of gravity of the opening region, and wherein said portion of the trajectory corresponds to a path of movement of the center of gravity as the slide-type valve body moves from a 5% valve opening position to a 40% valve opening position.