# US 8,785,110 B2 · Liquid ejection head and method of manufacturing the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,785,110 B2 - Document ID: US8785110B2 - Status: Granted - Kind: B2 - Application number: 13/939,513 - Filed: 2013-07-11 - Published: 2014-01-30 - Granted: 2014-07-22 - Earliest claimed: 2012-07-25 - Assignees: Canon Kabushiki Kaisha - Applicants: Canon Kabushiki Kaisha - Inventors: Takuma Kodoi; Yasunori Takei; Kenji Yabe; Isamu Horiuchi; Hyou Takahashi; Ken Ikegame - Web page: https://patentgrep.com/patent/US8785110B2 ## CPC - G03F 7/0015: {Production of aperture devices, microporous systems or stamps} - B41J 2/1603: {of the front shooter type} - B41J 2/1631: {photolithography} - B41J 2/1639: {sacrificial molding} - B41J 2/1645: {thin film formation by spincoating} - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors} - G03F 7/038: Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) - G03F 7/203: {comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation} - G03F 7/38: Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B41J: TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS ## Abstract A liquid ejection head is manufactured by forming a dent representing a substantially spherical profile so as to include a position for forming an ejection port on a surface of a photosensitive resin layer, then forming a latent image of the ejection port in the dent by an exposure treatment using a projection lens system, and developing the latent image. The center of the top surface of the latent image is shifted to the incoming side of the beam of exposure light from the lowest point of the dent. ## Claims ### Claim 1 A method of manufacturing a liquid ejection head by forming an ejection port forming member for configuring an ejection port for ejecting liquid by using a photosensitive resin layer on a surface of a substrate, the method comprising: (1) a step of forming a dent representing a substantially spherical profile in a region including the position for forming the ejection port on a surface of the photosensitive resin layer; (2) a step of forming a latent image corresponding to the ejection port in the dent by way of an exposure treatment using a projection lens system; and (3) a step of producing the ejection port by developing the latent image; the latent image being formed by a beam of exposure light refracted by the projection lens system and inclined from the direction perpendicular to the surface of the substrate in the exposure treatment in the above-described step (2); the center of a top surface of the latent image being shifted to the incoming side of the beam of exposure light from the lowest point of the dent. ### Claim 2 (depends on 1) The method according to claim 1, wherein the top surface of the latent image is arranged so as to include the lowest point of the dent. ### Claim 3 (depends on 2) The method according to claim 2, wherein the latent image has a lateral surface so as to form equal angles with the surface of the substrate at the transversal opposite ends of the lateral surface in a cross section taken along a plane that passes through the center of the top surface of the latent image and the lowest point of the dent and stands perpendicularly relative to the surface of the substrate. ### Claim 4 (depends on 2) The method according to claim 2, wherein: the ejection port forming member has a plurality of ejection ports arranged in a row so as to respectively correspond to a plurality of ejection energy generating elements formed in the surface of the substrate; and a plurality of dents are formed so as to respectively correspond to the plurality of ejection ports in the step (1); while a plurality of latent images are formed collectively so as to respectively correspond to the plurality of ejection ports in the exposure treatment in the step (2); and the center of the top surface of the latent image of each of the ejection ports located at and near the ends of the row of ejection ports is shifted to the incoming side of the beam of exposure light from the lowest point of the dent to an extent that corresponds to the incident angle of the beam of exposure light from the direction perpendicular to the surface of the substrate. ### Claim 5 (depends on 4) The method according to claim 4, wherein the lowest point of each of the dents is shifted toward the center of the row of ejection ports from the center of the corresponding ejection port. ### Claim 6 (depends on 1) The method according to claim 1, wherein the latent image has a lateral surface so as to form equal angles with the surface of the substrate at the transversal opposite ends of the lateral surface in a cross section taken along a plane that passes through the center of the top surface of the latent image and the lowest point of the dent and stands perpendicularly relative to the surface of the substrate. ### Claim 7 (depends on 6) The method according to claim 6, wherein the ejection port forming member has a plurality of ejection ports arranged in a row so as to respectively correspond to a plurality of ejection energy generating elements formed in the surface of the substrate; and a plurality of dents are formed so as to respectively correspond to the plurality of ejection ports in the step (1); while a plurality of latent images are formed collectively so as to respectively correspond to the plurality of ejection ports in the exposure treatment in the step (2); and the center of the top surface of the latent image of each of the ejection ports located at and near the ends of the row of ejection ports is shifted to the incoming side of the beam of exposure light from the lowest point of the dent to an extent that corresponds to the incident angle of the beam of exposure light from the direction perpendicular to the surface of the substrate. ### Claim 8 (depends on 7) The method according to claim 7, wherein the lowest point of each of the dents is shifted toward the center of the row of ejection ports from the center of the corresponding ejection port. ### Claim 9 (depends on 1) The method according to claim 1, wherein: the ejection port forming member has a plurality of ejection ports arranged in a row so as to respectively correspond to a plurality of ejection energy generating elements formed in the surface of the substrate; and a plurality of dents are formed so as to respectively correspond to the plurality of ejection ports in the step (1); while a plurality of latent images are formed collectively so as to respectively correspond to the plurality of ejection ports in the exposure treatment in the step (2); and the center of the top surface of the latent image of each of the ejection ports located at and near the ends of the row of ejection ports is shifted to the incoming side of the beam of exposure light from the lowest point of the dent to an extent that corresponds to the incident angle of the beam of exposure light from the direction perpendicular to the surface of the substrate. ### Claim 10 (depends on 9) The method according to claim 9, wherein the lowest point of each of the dents is shifted toward the center of the row of ejection ports from the center of the corresponding ejection port. ### Claim 11 (depends on 10) The method according to claim 10, wherein the plurality of ejection ports have the same positional relationship relative to the corresponding respective ejection energy generating elements. ### Claim 12 (depends on 9) The method according to claim 9, wherein the plurality of ejection ports have the same positional relationship relative to the corresponding respective ejection energy generating elements.