# US 8,785,108 B2 · Structure for pattern formation, method for pattern formation, and application thereof

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- Number: US 8,785,108 B2
- Document ID: US8785108B2
- Status: Granted
- Kind: B2
- Application number: 11/867,781
- Filed: 2007-10-05
- Published: 2008-04-03
- Granted: 2014-07-22
- Earliest claimed: 1997-08-08
- Assignees: Dai Nippon Printing Co., Ltd.
- Applicants: Hironori Kobayashi; Manabu Yamamoto; Daigo Aoki; Hironori Kamiyama; Shinichi Hikosaka; Mitsuhiro Kashiwabara
- Inventors: Hironori Kobayashi; Manabu Yamamoto; Daigo Aoki; Hironori Kamiyama; Shinichi Hikosaka; Mitsuhiro Kashiwabara
- Web page: https://patentgrep.com/patent/US8785108B2

## CPC

- B41N 1/006: {made entirely of inorganic materials other than natural stone or metals, e.g. ceramics, carbide materials, ferroelectric materials}
- B29D 11/00365: {Production of microlenses (lenticular sheets B29D11/00278)}
- B41C 1/1041: {by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern}
- G02B 3/0012: {characterised by the manufacturing method}
- G02B 3/0056: {arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses (G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085)}
- G02B 5/201: {in the form of arrays}
- G03F 7/0005: {Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor}
- G03F 7/0007: {Filters, e.g. additive colour filters; Components for display devices}
- G03F 7/0043: {Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof (G03F7/0044 takes precedence)}
- G03F 7/0757: {Macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence)}
- G03F 7/095: having more than one photosensitive layer (G03F7/075 takes precedence)
- G03F 7/11: having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)}
- G03F 7/001: {Phase modulating patterns, e.g. refractive index patterns}
- Y10T 428/24802: Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- B41N: PRINTING PLATES OR FOILS (photosensitive material G03); MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B29D: PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE (making granules B29B9/00; making preforms B29B11/00)
- B41C: PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES (photomechanical processes for producing printing surfaces G03F; photoelectrical processes for producing printing surfaces G03G)
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

## Claims

### Claim 1

A structure comprising:
a substrate;
a photocatalyst-containing layer provided on the substrate, containing titanium oxide as a photocatalyst, and having a high critical surface tension; and,
a patterned layer having a low critical surface tension which is decomposable and removable through photocatalytic action and provided on the photocatalyst-containing layer,
wherein the photocatalyst-containing layer contains a compound having a siloxane bond.

### Claim 2 (depends on 1)

The structure according to claim 1, wherein the structure is an original plate for a printing plate.

### Claim 3

A structure comprising:
a substrate;
a photocatalyst-containing layer provided on the substrate, containing titanium oxide as a photocatalyst, and having a high critical surface tension; and,
a patterned layer having a low critical surface tension which is decomposable and removable through photocatalytic action and provided on the photocatalyst-containing layer,
wherein the photocatalyst-containing layer contains silicone.

### Claim 4 (depends on 3)

The structure according to claim 3, wherein the silicone has been prepared from a composition containing a reactive silicone compound.

### Claim 5 (depends on 3)

The structure according to claim 3, wherein the structure is an original plate for a printing plate.