# US 8,785,081 B2 · Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same

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- Number: US 8,785,081 B2
- Document ID: US8785081B2
- Status: Granted
- Kind: B2
- Application number: 13/024,271
- Filed: 2011-02-09
- Published: 2011-08-11
- Granted: 2014-07-22
- Earliest claimed: 2010-02-11
- Assignees: Samsung Display Co., Ltd.
- Applicants: Do-Young Kim; Young-Gil Kwon; Seung-Mook Lee; Dae-Hoon Kim; Sun-Hoe Kim; Min-Chul Suh
- Inventors: Do-Young Kim; Young-Gil Kwon; Seung-Mook Lee; Dae-Hoon Kim; Sun-Hoe Kim; Min-Chul Suh
- Web page: https://patentgrep.com/patent/US8785081B2

## CPC

- B41M 3/003: {on optical devices, e.g. lens elements; for the production of optical devices (production by thermal imaging means B41M5/265)}
- B41M 3/00: Printing processes to produce particular kinds of printed work, e.g. patterns ({printing apparatus or machines of special type or for particular purposes B41F17/00;} special designs or pictures per se B44F; manufacturing printed circuits using printing techniques H05K3/12 {; manufacturing organic semiconductor devices using printing techniques H10K71/13})
- H10K 71/18: using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
- B41M: PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING, (correction of typographical errors B41J; processes for applying transfer pictures or the like B44C1/16; fluid media for correction of typographical errors by coating C09D10/00; printing textiles D06P)
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A mask for laser induced thermal imaging and a method of fabricating an organic electro-luminescence display device using the mask. A mask includes a transparent substrate including a transmitting region; a reflective layer pattern on a first surface of the transparent substrate other than the transmitting region; and a scattering unit on at least one of the first surface or a second surface opposite the first surface of the transparent substrate, and the scattering unit is at a position corresponding to the reflective layer pattern. The mask can accurately irradiate a laser to a donor substrate and prevent or reduce damage of the laser generator due to the laser beam being reflected by the mask.

## Claims

### Claim 1

A mask comprising:
a transparent substrate including a transmitting region having a first transmittance, and another region having a second transmittance less than the first transmittance;
a reflective layer pattern on a first surface of the transparent substrate other than the transmitting region; and
wherein the transparent substrate includes a scattering unit including ruggedness or protrusions and depressions on the first surface of the transparent substrate,
wherein the scattering unit is at a position corresponding to the reflective layer pattern, and
wherein the reflective layer pattern is on the scattering unit.

### Claim 2 (depends on 1)

The mask of claim 1, wherein the reflective layer pattern comprises a metallic material.

### Claim 3 (depends on 1)

The mask of claim 1, wherein the scattering unit is in the another region having the second transmittance less than the first transmittance of the transmitting region.

### Claim 4 (depends on 1)

The mask of claim 1, wherein the second surface of the transparent substrate is on a side in which a laser generator is located, and the first surface of the transparent substrate is on a side opposite to the side in which the laser generator is located.

### Claim 5

A mask comprising:
a transparent substrate including a transmitting region;
a reflective layer pattern on a first surface of the transparent substrate other than the transmitting region; and
a scattering unit comprising a first scattering unit on a second surface opposite the first surface of the transparent substrate and a second scattering unit on the first surface of the transparent substrate,
wherein the scattering unit is at a position corresponding to the reflective layer pattern, and
wherein the reflective layer pattern is on the second scattering unit.